Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature

Aaltonen, Titta; Ritala, Mikko; Tung, Yung-Liang; Chi, Yun; Arstila, Kai; Meinander, Kristoffer; Leskelä, Markku

doi:10.1557/jmr.2004.0426

Cited by 158 publications

(181 citation statements)

References 25 publications

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“…[35][36] This change is expected given that the ALD Pt growth per cycle decreases with decreasing temperature. 37 We selected the 523K deposition temperature because it produced smaller particles with a narrower size distribution.…”

Section: Resultsmentioning

confidence: 99%

Adsorbate-Induced Structural Changes in 1–3 nm Platinum Nanoparticles

Zhao²,

Rivas

et al. 2014

J. Am. Chem. Soc.

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ABSTRACT:We investigated changes in the Pt-Pt bond distance, particle size, crystallinity, and coordination of Pt nanoparticles as a function of particle size (1-3 nm) and adsorbate (H 2 , CO) using synchrotron radiation pair distribution function (PDF) and X-ray absorption spectroscopy (XAS) measurements. The ~1 nm Pt nanoparticles showed a Pt-Pt bond distance contraction of ~1.4%. The adsorption of H 2 and CO at room temperature relaxed the Pt-Pt bond distance contraction to a value close to that of bulk fcc Pt. The adsorption of H 2 improved the crystallinity of the small Pt nanoparticles. However, CO adsorption generated a more disordered fcc structure for the 1-3 nm Pt nanoparticles compared to the H2 adsorption Pt nanoparticles. In situ XANES measurements revealed that this disorder results from the electron back donation of the Pt nanoparticles to CO, leading to a higher degree of rehybridization of the metal orbitals in the Ptadsorbate system.

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Section: Resultsmentioning

confidence: 99%

Adsorbate-Induced Structural Changes in 1–3 nm Platinum Nanoparticles

Zhao²,

Rivas

et al. 2014

J. Am. Chem. Soc.

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“…The fact that the growth per cycle is reduced at lower substrate temperatures is not yet understood. 21 From surface science studies, it can be inferred that the dissociative chemisorption of O 2 ͓on Pt͑111͔͒ should not be the limiting factor. 12 On the other hand, the remote plasma ALD process which uses atomic oxygen from the gas phase has a higher growth rate than the thermal process at 200°C.…”

Section: Resultsmentioning

confidence: 99%

Remote Plasma ALD of Platinum and Platinum Oxide Films

Knoops

Mackus

Donders

et al. 2009

Electrochem. Solid-State Lett.

121

207

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“…[34][35][36][37][38] Furthermore, the nature of the precursor ligands does not seem to have a large influence on the lower limit of the temperature window. For Ir ALD for example, high-quality films can be deposited for substrate temperatures above ∼220…”

Section: Discussionmentioning

confidence: 99%

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

Erkens

Mackus

Knoops

et al. 2012

ECS J. Solid State Sci. Technol.

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. Insights into the temperature dependence of atomic layer deposition (ALD) of Pt using (methylcyclopentadienyl)trimethylplatinum, (MeCp)PtMe 3 , precursor and O 2 are presented, based on a study of reaction products by time-resolved quadrupole mass spectrometry (QMS) measurements. Above 250 • C, Pt ALD proceeds through unhindered O 2 dissociation at the Pt surface, inducing complete and instantaneous combustion of the precursor ligands. Quantification of the QMS data revealed that at 300 • C, approximately 20% of the C-atoms react during the precursor pulse, forming mainly CH 4 (∼18%) balanced by CO 2 (∼2%). The remaining 80% of the C-atoms are combusted during the O 2 pulse. Time-resolved data indicated that the combustion reactions compete with the hydrogenation reactions for the available surface carbon. Combustion reactions were found to be dominant, provided that a sufficient amount of chemisorbed oxygen is available. When the temperature drops below 250 • C, deposition becomes hindered by the presence of a carbonaceous surface layer of partially fragmented and dehydrogenated precursor ligands, formed during the precursor pulse. The carbonaceous layer limits dissociative chemisorption of O 2 and hence combustion reactions (leading to CO 2 ) whereas reduced surface reactivity also limits (de-)hydrogenation reactions (leading to CH 4 ). Below 100 • C, the carbonaceous layer fully prevents O 2 dissociation and ALD of Pt cannot proceed.

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Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature

Cited by 158 publications

References 25 publications

Adsorbate-Induced Structural Changes in 1–3 nm Platinum Nanoparticles

Adsorbate-Induced Structural Changes in 1–3 nm Platinum Nanoparticles

Remote Plasma ALD of Platinum and Platinum Oxide Films

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

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