Electron Microscopy and Structure of Materials 1972
DOI: 10.1525/9780520323230-013
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"Analytical Methods in Photoemission Electron Microscopy"

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Cited by 3 publications
(2 citation statements)
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“…Recently Flournoy et al (1) described a thin-layer thickness measuring instrument based on the use of Fourier transform spectroscopy. Referring to the thickness d of a transparent coating of refractive index n on an opaque or transparent substrate they state that the distance between two side bursts equals 2 dn, ignoring any phase shift.…”
Section: Introductionmentioning
confidence: 99%
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“…Recently Flournoy et al (1) described a thin-layer thickness measuring instrument based on the use of Fourier transform spectroscopy. Referring to the thickness d of a transparent coating of refractive index n on an opaque or transparent substrate they state that the distance between two side bursts equals 2 dn, ignoring any phase shift.…”
Section: Introductionmentioning
confidence: 99%
“…4). Wegmann (1) proposed that such material contrasts were at least partly produced by contamination layers. This paper is a study on this hypothesis and the possible correlations between material contrasts and the doping of diffused areas in integrated circuits.…”
mentioning
confidence: 99%