2015 IEEE Bipolar/BiCMOS Circuits and Technology Meeting - BCTM 2015
DOI: 10.1109/bctm.2015.7340569
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Analysis of residual errors due to calibration transfer in on-wafer measurements at mm-wave frequencies

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Cited by 5 publications
(4 citation statements)
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“…The process of transferring the first-tier calibration to another structure assumes that the delta capacitance introduced by changing the substrate under the probes (i.e., boundary conditions) is negligible. As it was shown in [8], this capacitance is dependent on the probe topology and substrate characteristic, creating a coupling that increases with frequencies.…”
mentioning
confidence: 89%
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“…The process of transferring the first-tier calibration to another structure assumes that the delta capacitance introduced by changing the substrate under the probes (i.e., boundary conditions) is negligible. As it was shown in [8], this capacitance is dependent on the probe topology and substrate characteristic, creating a coupling that increases with frequencies.…”
mentioning
confidence: 89%
“…The impedance extracted using the method in [22] presents some fluctuations, which can be attributed to the inductive nature of the probe to pad transition (i.e., step in transmission linewidth). Moreover, both the mentioned techniques suffer from the errors arising from the calibration transfer from the fused silica substrate as described in [8]. It is interesting to notice from Fig.…”
Section: A Z 0 Extraction Proceduresmentioning
confidence: 99%
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“…In [1], the probe-to-substrate interaction is identified as the dominant uncertainty source in transfer of traceability between different substrate materials. Furthermore, accurate definition of the measurement reference plane position is critical for probe-independent characterization of device S-parameters [2].…”
Section: Introductionmentioning
confidence: 99%