An optimized texturing process for silicon solar cell substrates using TMAH

Iencinella, D.; Centurioni, E.; Rizzoli, R.; Zignani, F.

doi:10.1016/j.solmat.2004.09.020

Cited by 90 publications

(46 citation statements)

References 1 publication

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“…Texturing is often combined in a single step with the removal of wire-saw damage, which can penetrate 5-10 µm deep from each surface. To circumvent potential alkaline contamination of surfaces, al-ternative random pyramid texturing solutions have been explored, including the use of tetramethyl ammonium hydroxide (TMAH) [51].…”

Section: Substrates and Surface Preparationmentioning

confidence: 99%

High-efficiency Silicon Heterojunction Solar Cells: A Review

Wolf

Descoeudres

Holman

et al. 2012

Green

745

352

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Abstract. Silicon heterojunction solar cells consist of thin amorphous silicon layers deposited on crystalline silicon wafers. This design enables energy conversion efficiencies above 20% at the industrial production level. The key feature of this technology is that the metal contacts, which are highly recombination active in traditional, diffused-junction cells, are electronically separated from the absorber by insertion of a wider bandgap layer. This enables the record open-circuit voltages typically associated with heterojunction devices without the need for expensive patterning techniques. This article reviews the salient points of this technology. First, we briefly elucidate device characteristics. This is followed by a discussion of each processing step, device operation, and device stability and industrial upscaling, including the fabrication of solar cells with energyconversion efficiencies over 21%. Finally, future trends are pointed out.

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Section: Substrates and Surface Preparationmentioning

confidence: 99%

High-efficiency Silicon Heterojunction Solar Cells: A Review

Wolf

Descoeudres

Holman

et al. 2012

Green

745

352

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“…At 1.5 min, the pores totally disappeared due to the full dissolution of their walls and the surface was only composed of 5 mm long NSpikes, spaced by inverted pyramids pits (with exposed (111) faces), resulting from the anisotropic AE of the macropore bottoms. [17][18][19] Ultimately, when the reaction was carried out for extended times (here 2 min, as shown in the last column of Figure 2), the NSpikes were totally etched and only a rough Si surface remained. We observed an intriguing color change of the surface occurring during the AE reaction, and have consequently investigated the optical properties of the structured surfaces.…”

Section: Resultsmentioning

confidence: 99%

“…[17][18][19] Ultimately, when the reaction was carried out for extended times (here 2 min, as shown in the last column of Figure 2), the NSpikes were totally etched and only a rough Si surface remained. We observed an intriguing color change of the surface occurring during the AE reaction, and have consequently investigated the optical properties of the structured surfaces.…”

Section: Resultsmentioning

confidence: 99%

Enhancing light trapping of macroporous silicon by alkaline etching: application for the fabrication of black Si nanospike arrays

Loget

Vacher

Fabre

et al. 2017

Mater. Chem. Front.

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ABSTRACT:The synthesis of highly absorbing silicon (black Si (BSi)) is a very active research topic with promising applications in the field of sustainable energies, ultrasensitive sensing and antibacterial materials. Here, we show that extended alkaline etching of macroporous Si, fabricated by photoelectrochemical etching drastically influence the surface structures as well as their optical properties. We demonstrate that this treatment can considerably improve the light trapping of the surface and we finally show that it is possible to use it for fabricating very quickly highly-absorbing arrays of sharp and crystalline BSi nanospikes (NSpikes).

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“…Some researchers have reported the texturization with tribasic sodium phosphate (Na 3 PO 4 ) and found that the Na 3 PO 4 plays the role of a surface active agent and makes texturization more effective without IPA [8]. We are reporting the use of tripotassium phosphate (K 3 PO 4 ) and Potassium silicate (K 2 SiO 3 ) solution for the texturization on silicon surface in different condition [9] (2). Therefore, in K 3 PO 4 and K 2 SiO 3 solution, the OH -is generated and help for forming small pyramids.…”

Section: Introductionmentioning

confidence: 99%