2010
DOI: 10.1364/oe.18.019485
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Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect

Abstract: The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern w… Show more

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Cited by 78 publications
(42 citation statements)
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“…Examples are for the measurements of the refractive index [3], for sensing a distance or a displacement [4], for laser resonators [5,6], lithography [7], array illumination [8], sub-wavelength focusing [9], imaging [10], lensless image synthesis [11] and 2D optical correlator [12]. Such appealing applications draw attention and led to intensive investigations; both experimentally and theoretically.…”
Section: Introductionmentioning
confidence: 99%
“…Examples are for the measurements of the refractive index [3], for sensing a distance or a displacement [4], for laser resonators [5,6], lithography [7], array illumination [8], sub-wavelength focusing [9], imaging [10], lensless image synthesis [11] and 2D optical correlator [12]. Such appealing applications draw attention and led to intensive investigations; both experimentally and theoretically.…”
Section: Introductionmentioning
confidence: 99%
“…Enabled by the flexible incidence angle and collimation control, direct self-imaging (Fig. 6) and self-imaging with pinhole arrays [138] as well as gray-scale lithography by self-imaging [139] (both Fig. 7) were demonstrated in 2010.…”
Section: History and Trendsmentioning
confidence: 99%
“…NFH is limited to structures with very short periods but was studied extensively for this range [160][161]. Further geometries have been demonstrated by Talbot [135][136][137][138] and displacement Talbot lithography [149,150,153] as well as an early stage of RO-PSM technology [157]. Especially for applications in which substrates of poor quality are unavoidable, D-TL can by very interesting since high resolution lithography on strongly corrugated substrates is enabled.…”
Section: Applicationsmentioning
confidence: 99%
“…Since self-imaging of periodic objects was first described by Talbot in 1836 [1], it has attracted much attention due to numerous applications ranging from displacement sensors [2] to laser resonators [3], lithography [4], array illumination [5] and splitter [6]. The selfimaging can be basically explained as a property of multimode waveguides by which an input field profile is reproduced in single or multiple images at regular intervals along the propagation direction [7].…”
Section: Introductionmentioning
confidence: 99%