IBM J. Res. & Dev.
 1988
DOI: 10.1147/rd.324.0514
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Advanced electron-beam lithography for 0.5-µm to 0.25-µm device fabrication

Fritz J. Hohn
1
,
Alan D. Wilson
2
,
P. Coane
3
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Cited by 3 publications
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Application of Monte Carlo modelling to linewidth control for electron beam direct write over device topography

Fretwell
1
,
Jones
2
1990
Microelectronic Engineering
1
0
0
0
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Application of Monte Carlo modelling to linewidth control for electron beam direct write over device topography

Fretwell
1
,
Jones
2
1990
Microelectronic Engineering
1
0
0
0
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Calculation of the influence of electric fields on primary and secondary electrons in electron beam testing of submicron structures

Schottler1,
Störzer2,
Kubalek3
1992
Microelectronic Engineering
7
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1
0
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High-throughput, high-resolution electron-beam lithography

Pfeiffer
1
,
Groves
2
,
Newman3
1988
IBM J. Res. & Dev.
13
1
8
0
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