2007
DOI: 10.1016/j.microrel.2007.07.076
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Advanced backside failure analysis in 65nm CMOS technology

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Cited by 4 publications
(3 citation statements)
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“…For this reason, their detection and localization is a wellknown procedure used in failure analysis or design debugging [3,4], which can be based on microelectronic thermometric techniques [3]. However, in present-day complementary metal-oxide semiconductor (CMOS) technologies, monitoring the temperature of the chip surface with off-chip techniques is a challenging task: surface temperature is strongly attenuated by several metal layers (up to thirteen levels [5]) placed above the silicon surface. Moreover, in these technologies, there is a clear requirement for hot spot localization in terms of micronic and submicronic spatial resolution because the dimensions of the devices shrink and integration density increases [5].…”
Section: Introductionmentioning
confidence: 99%
“…For this reason, their detection and localization is a wellknown procedure used in failure analysis or design debugging [3,4], which can be based on microelectronic thermometric techniques [3]. However, in present-day complementary metal-oxide semiconductor (CMOS) technologies, monitoring the temperature of the chip surface with off-chip techniques is a challenging task: surface temperature is strongly attenuated by several metal layers (up to thirteen levels [5]) placed above the silicon surface. Moreover, in these technologies, there is a clear requirement for hot spot localization in terms of micronic and submicronic spatial resolution because the dimensions of the devices shrink and integration density increases [5].…”
Section: Introductionmentioning
confidence: 99%
“…Traditionally, off-chip temperature measurement set-ups have been used to detect unexpected hot spots within digital circuits [ 2 , 3 , 4 , 5 ]. Hot spots might appear either due to the presence of a defect in the circuit structure [ 6 , 7 , 8 , 9 ] or by a nonuniform power dissipation on the die surface, which is a common situation in microprocessors [ 4 , 10 ]. In complex digital systems, such as microprocessors, temperature sensors are built-in within the same silicon die in order to ensure reliable system performance, i.e., they perform power-temperature monitoring to control the activation of cooling systems, to modulate microprocessor supply voltage or clock frequency, or to assert if the workload of a specific microprocessor block can be increased or should be reduced to avoid nonuniform power distributions [ 11 , 12 , 13 , 14 , 15 , 16 , 17 , 18 ].…”
Section: Introductionmentioning
confidence: 99%
“…The growing demand for high spatial resolution in optical inspection for failure analysis of semiconductor integrated circuits (ICs) has aroused interest in employing aplanatic solid immersions lenses (aSILs) [1][2][3][4][5][6][7]. In such applications, aSILs are placed in intimate mechanical contact with the polished back-side of an IC chip, hence transforming the silicon substrate into a high refractive index immersion medium (n Si = ~3.5) for high numerical aperture (NA) sub-surface imaging.…”
Section: Introductionmentioning
confidence: 99%