Adaptation of roll-to-roll imprint lithography: from flexible electronics to structural templates

Abstract

HP has previously demonstrated the roll-to-roll (R2R) fabrication of active-matrix display backplanes using the SelfAligned Imprint Lithography (SAIL) process. This approach permits a single imprint step to create a multi level mask comprising all patterns required for subsequent etching steps, obviating the need for multiple alignment steps. In this paper the imprint lithography technique and aspects of SAIL are reviewed. New work using imprint processing to generate structural templates, with aspect ratios approaching 6:1, for fluid containment will be presented. Arrays of transparent well structures, formed on a flexible transparent substrate provide the basis for a color display filter matrix that is filled by inkjet deposition of pigmented resins. A primary benefit of this approach is precise color pattern definition. A separation between primary color fields of 4 microns is realized without risk of color mixing or overlap. Components patterned with high absolute precision by imprint lithography were readily integrated with parts from other sources to yield flexible color reflective display demonstrator panels. This work highlights the flexibility of imprint processing and its suitability for use with a wide variety of materials and in differing applications.

Nanoimprint lithography and future patterning for semiconductor devices

“…Finally, it should be noted that nanoimprint lithography is likely to impact markets other than semiconductor. New patterning technology including large area imprinting 21,22 and roll-to-roll imprint 23,24 can be applied to devices such as solar cells, light emission diodes, and patterned media for hard disk drives. Any new technology requires an extensive infrastructure, and the expertise and cooperation of the entire industry will be necessary to realize the next generation patterning revolution.…”

Nanomanufacturing: A Perspective

“…The limiting factors are the overall concentration of nanoparticles, which cannot be increased indefinitely without causing deposition in unpatterned areas, and the evaporation rate of the carrier fluid, which also cannot be increased dramatically. Interestingly, the combination of a roll-to-roll patterned substrate with inkjet printing has been used to create color filters with a precision far better than can be achieved with inkjet alone . Although currently only being used for micrometer-sized features, this is potentially a highly extensible approach.…”

“…Interestingly, the combination of a roll-to-roll patterned substrate with inkjet printing has been used to create color filters with a precision far better than can be achieved with inkjet alone. 398 Although currently only being used for micrometer-sized features, this is potentially a highly extensible approach.…”

Large-Area Nanotemplate Process and Its Application to Roll Imprint

“…Candidates for potential technical strategies for large-area nanopatterning include flat-bed large-area nanoimprinting [5][6][7] and roll nanoimprinting. [8][9][10][11][12][13] Associated fundamental technologies include process mechatronics, system precision tooling, [14][15][16] and the preparation of largearea nanotemplates. 17,18) Flat-bed large-area nanoimprinting requires a correspondingly large nanotemplate.…”