Large-Area Nanotemplate Process and Its Application to Roll Imprint

Choi, Jun-Hyuk; Lee, Soon-Won; Lee, Jihye; Choi, Dae‐Geun; Jeong, Jun‐Ho; Lee, Eung-Sug

doi:10.1143/jjap.51.06fj01

Cited by 3 publications

(3 citation statements)

References 32 publications

(41 reference statements)

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“…Since the photoresist is solidified, a small demolding angle within 2 ∘ will have a lower chance to cause defects in a pattern with low aspect ratio but is helpful to reduce the demolding difficulty, especially for a large imprint area. 23–25 While for patterns with high aspect ratio, demolding angle should be strictly avoided. This can be achieved by creating a vacuum in the spherical gap.…”

Section: Structure Design Of the Parallel Alignment Devicementioning

confidence: 99%

Development of a force-decoupled parallel alignment device for nanoimprint applications

Chen

et al. 2013

Proceedings of the Institution of Mechanical Engineers, Part B:

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High-precision parallel alignment between the substrate and the template is of great importance for nanoimprint lithography. Recently, flexure-based mechanism is commonly employed to realize high-precision parallel alignment; however, stiffness in imprint axis is hard to guarantee. In this article, a new parallel alignment device is proposed, which enables the imprinting force bypass the delicate alignment mechanism, thus eliminating the side effects of imprint forces and ensuring parallel alignment able to be carried out properly. A spherical air bearing is adopted in the device for the above-mentioned purpose through decoupling the nonuniform imprinting forces distributing on the template, allowing only the torque to reach the delicate alignment mechanism. The structural parameters of the air bearing are optimized through modeling and analysis of the bearing performances in terms of load-carrying capacity and stiffness. For the bearing preload, a set of permanent magnets are employed. The preliminary experimental results show that high load capacity and stiffness are achieved, which are consistent with the derived model.

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Section: Structure Design Of the Parallel Alignment Devicementioning

confidence: 99%

Development of a force-decoupled parallel alignment device for nanoimprint applications

Chen

et al. 2013

Proceedings of the Institution of Mechanical Engineers, Part B:

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show abstract

“…to fabricate large-area master molds 24,25,27,29 . Although multiple-stitched exible molds have been widely used in roll-based NIL, there is a critical limit to satisfying the requirements of practical applications because of the clear formation of alignment marks and stitching seams, which are easily detectable by the naked eye 23,30 .…”

Section: Introductionmentioning

confidence: 99%

Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns

Kim

Seo

Lee

et al. 2022

Preprint

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The main challenge in preparing a flexible mold stamp using roll-to-roll nanoimprint lithography is to simultaneously increase the imprintable area with a minimized perceptible seam. However, the current methods for stitching multiple small molds to fabricate large-area molds and functional surfaces typically rely on the alignment mark, which inevitably produces a clear alignment mark and stitched seam. In this study, a self-pattern alignment (SPA) method inspired by moiré engineering is proposed to fabricate scalable functional surfaces and flexible imprint molds with quasi-seamless and alignment mark-free patterning, which is based on the Fourier spectral analysis of moiré patterns formed by superposed identical patterns. By harnessing the rotational invariance property in the Fourier transform, SPA was confirmed to be a simple and efficient method for extracting the rotational and translational offsets in overlapped periodic or nonperiodic patterns with a minimized stitched region, thereby allowing for the large-area and quasi-seamless fabrication of imprinting molds and functional surfaces, such as liquid-repellent film and micro-optical sheets, that surpass the conventional alignment and stitching limits and potentially expand their application in producing large-area metasurfaces.

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“…Accordingly, extensive efforts have been made to fabricate scalable and flexible imprint molds [23][24][25][26] . Owing to these difficulties in fabricating multiscale patterns directly over a large area, a step-and-repeat process using mechanical alignment system 26,27 and shadow mask has been developed to fabricate large-area master molds 9,24,26,28 . Although multiple-stitched flexible molds have been widely used in roll-based NIL, there is a critical limit to satisfying the requirements of practical applications because of the clear formation of alignment marks and stitching seams, which are easily detectable by the naked eye 23,29 .…”

mentioning

confidence: 99%

Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns

et al. 2023

View full text Add to dashboard Cite

The main challenge in preparing a flexible mold stamp using roll-to-roll nanoimprint lithography is to simultaneously increase the imprintable area with a minimized perceptible seam. However, the current methods for stitching multiple small molds to fabricate large-area molds and functional surfaces typically rely on the alignment mark, which inevitably produces a clear alignment mark and stitched seam. In this study, we propose a mark-less alignment by the pattern itself method inspired by moiré technique, which uses the Fourier spectral analysis of moiré patterns formed by superposed identical patterns for alignment. This method is capable of fabricating scalable functional surfaces and imprint molds with quasi-seamless and alignment mark-free patterning. By harnessing the rotational invariance property in the Fourier transform, our approach is confirmed to be a simple and efficient method for extracting the rotational and translational offsets in overlapped periodic or nonperiodic patterns with a minimized stitched region, thereby allowing for the large-area and quasi-seamless fabrication of imprinting molds and functional surfaces, such as liquid-repellent film and micro-optical sheets, that surpass the conventional alignment and stitching limits and potentially expand their application in producing large-area metasurfaces.

show abstract

Large-Area Nanotemplate Process and Its Application to Roll Imprint

Cited by 3 publications

References 32 publications

Development of a force-decoupled parallel alignment device for nanoimprint applications

Development of a force-decoupled parallel alignment device for nanoimprint applications

Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns

Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns

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