2011 IEEE 61st Electronic Components and Technology Conference (ECTC) 2011
DOI: 10.1109/ectc.2011.5898663
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A thermal performance measurement method for blind through silicon vias (TSVs) in a 300mm wafer

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Cited by 13 publications
(3 citation statements)
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“…It can be seen from Figures 2 to 7 that, there are many important tasks in the MEOL (solder bumping / temporary bonding / backgrinding / TSV Cu revealing / thin wafer handling / de-bonding / cleaning), assembly and test; thus the OSAT should strive to make themselves ready for a robust and high yield manufacturing process. In order to avoid finger pointing and have a smooth hand-off from the FAB to OSAT of the un-finished (blind) TSV wafers, more research and development works should be performed on the testing methods of the blind TSV wafers for electrical, for example [20,21], thermal, for example [22], and mechanical performances.…”
Section: Summary and Recommendationsmentioning
confidence: 99%
“…It can be seen from Figures 2 to 7 that, there are many important tasks in the MEOL (solder bumping / temporary bonding / backgrinding / TSV Cu revealing / thin wafer handling / de-bonding / cleaning), assembly and test; thus the OSAT should strive to make themselves ready for a robust and high yield manufacturing process. In order to avoid finger pointing and have a smooth hand-off from the FAB to OSAT of the un-finished (blind) TSV wafers, more research and development works should be performed on the testing methods of the blind TSV wafers for electrical, for example [20,21], thermal, for example [22], and mechanical performances.…”
Section: Summary and Recommendationsmentioning
confidence: 99%
“…This test vehicle can be degenerated to the case of: (a) wide I/O memory if there is not the memory-chip stacking nor the TSVs in the mechanical/thermal chips and the interposer is either an logic, microprocessor, or SoC; (b) wide I/O DRAM if there are not mechanical and thermal chips and the interposer is a logic chip; and (c) wide I/O interface if there is not the memory-chip stacking and there is not any TSV in the thermal/ mechanical chips. Thus, the core enabling technologies (such as via etching, dielectric, barrier and seed layers deposition, via filling, CMP, thin-wafer handling, electrical and thermal design and test of TSVs, wafer bumping of ultra finepitch lead-free microbumps, fluxless C2W bonding, electronmigration of microbumps, and reliability of microbump assemblies) developed [19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35][36] with this test vehicle are very useful and can have very broad applications. surrounding Si as shown in Figure 9.…”
Section: (45) Wide I/o Interfacementioning
confidence: 99%
“…Thermal management is one of the critical issues of 3D IC integration [11][12][13][14][15][16][17][18][19][20][21]. This is because: (1) the heat generated by stacked multifunctional chips in miniature packages is quite high; (2) 3D IC increase the net heat flux that must be dissipated via per unit surface area of package; (3) enclosed chips in the 3D IC package may be easily overheated if the accumulated heat is not properly drained away; (4) the space between the 3D stack may be too small for cooling channels (i.e., no gap for fluid flow); and (5) thinner chips may create more extreme conditions for on-chip hot spots.…”
Section: Introductionmentioning
confidence: 99%