“…Throughout the last thirty years, many different fabrication techniques have been explored in order to make high enhancement SERS substrates, including electrochemical oxidation reduction cycles (ORC) (Pemberton, 1991), chemical etching (Carron et al, 1991), metal island films (Schlegel and Cotton, 1991), electron beam lithography (Kahl et al, 1998), and nanosphere lithography (Jensen et al, 1999) to name a few. However, none of these techniques have been shown to produce large enough area, with high signal enhancement and uniformity that SERS substrates would be required for array techniques.…”