Pattemed self-assembled monolayers on solid substrates are being investigated for applications in material science, microelectronics, and biotechnology.' A W-photolithographic method was recently reported for patterning alkanethiol self-assembled monolayers (SAMs) on Au and Ag surfaces with micrometer r e~o l u t i o n .~~~ It was shown that upon exposure to UV light, thiolate head groups are photooxidized to sulfoxide species. The oxidized sulfur species are weakly bound to the surface relative to thiolates and thus are easily displaced from the monolayer by immersion in a solution containing a second alkanethiol molecule." Although some of the oxidation products from the W photolysis procedure have been identified using X-ray photoelectron spectroscopy and laser desorption mass spectrometry, many questions still remain about the mechanism of the photooxidation reaction. In this report, we present surfaceenhanced Raman spectroscopy (SERS) results acquired from W-irradiated SAMs on Ag. We show that the photooxidation of the alkanethiol monolayer proceeds essentially by a twostep mechanism. First, W exposure causes C-S bond scission and subsequent desorption of the hydrocarbon chain. Second, the exposed sulfur is oxidized to sulfite and sulfate species.SERS was used to monitor the disappearance of Raman bands associated with S-C and C-C bonds of the n-alkanethiols and the appearance of bands associated with S-0 species. Because of the relatively high Raman cross sections for the C-S and S-0 vibrations, SERS was found to be a highly sensitive technique for characterizing the effects of W exposure on alkanethiol monolayers. SAMs comprised of n-alkanethiols [CH3(CH&SH, where n = 5 , 9, and 171 were formed on electrochemically roughened Ag substrate^.^ SER spectra6 from as-formed S A M s were qualitatively similar to those reported previously? indicating the presence of densely-packed, highquality monolayers. W exposure of a sample was performed in air without removing the sample from its initial position, (1) For example, see: Stenger, D. A.; Georger, J. H.; Dulcey, C. S.; Hickman, J. J.; Rudolph, A. S.; Nielsen, T. B.; McCort, S. M.; Calvert, J. M. Electrodes were polished with 0.05 p n grit alumina, rinsed with 18 MQ deionized water, and sonicated for 5 min to remove all traces of the powder. Electrochemical roughening was done in a 1.0 M NaC104 solution and consisted of three cycles from -0.5 to -1-0.6 V (vs Ag/AgCl) with the potential poised for 30 and 10 s at the negative and positive potential extremes, respectively. The electrode was sequentially rinsed with water and ethanol and incubated in a 1-5 mM alkanethiol-ethanol solution for a minimum of 24 h. 0002-7863/95/1517-9574$09.00/0 600 760 SO0 900 1000 11'00 Raman Shift (cml) Figure 1. SER spectra acquired from a hexanethiol S A M on Ag after total UV exposure times of 0, 1, 2, 3, 4, 5 , and 6 min. See text for description.ensuring that the identical sample area was probed following each exposure. The low-pressure Hg pen-lamp (-3 mW/cm2) used for irradiating ...