1977
DOI: 10.1002/pssa.2210440221
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A study of VVOxPb Josephson tunnel junctions

Abstract: The current-voltage characteristics and especially the behaviour of the critical Josephson currents of V-V0,-Pb tunnel junctions are investigated experimentally. The maximum Josephson current and its temperature dependence deviate strongly from the theory. The London penetration depth of the vanadium films is found to be much larger than for pure vanadium but its temperature dependence is as expected from theory. The critical temperatures of the vanadium films are between 4.4 and 5.0 K. The ratio 2A(0)/(kFc) d… Show more

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Cited by 10 publications
(3 citation statements)
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“…In particular the origin of such large conductance is likely related to the presence of vanadium. Similar high subgap conductances have been observed in several occasions in V-based tunnel junctions 11,18,40,42,44 , as well as in Nb-based tunnel junctions 45 .…”
Section: Transport Spectroscopysupporting
confidence: 85%
“…In particular the origin of such large conductance is likely related to the presence of vanadium. Similar high subgap conductances have been observed in several occasions in V-based tunnel junctions 11,18,40,42,44 , as well as in Nb-based tunnel junctions 45 .…”
Section: Transport Spectroscopysupporting
confidence: 85%
“…I T e have to note, however, that the critical temperatures of the electrodes of the junctions and their energy gaps arenot equal. Using relation (6) it is possible to determine the internal field H froin the ratio of the measured I , ( T ) extrapolated to 0 K for V-YO,-Pb junctions [6] to the theoretical value IJO) of Anibegaokar and Baratoff.…”
Section: Discussion Of the Bchaviour Of Vo Barriersmentioning
confidence: 99%
“…The voltage range for the original JQP cycle, on the other hand, is expressed in terms of the similar inequality with Δ Al in equation ( 3) being replaced with Δ Δ + Al V [20][21][22][23]. The anomalous superconducting behavior of V-based junctions has been well known since 1960s [28]; it has been considered that surface degradation of the first atomic layer of the deposited V at the interface with the oxide barrier [29] as well as the spin fluctuation effect [30] contributes to a finite QP DOS inside the superconducting gap. We measured transport characteristics of the large reference Al/AlO x /V single junction with = E c 10 μeV in order to study the basic property of the constituent junctions of the SSETs.…”
Section: Devicementioning
confidence: 99%