2015 Fifth International Conference on Advanced Computing &Amp; Communication Technologies 2015
DOI: 10.1109/acct.2015.51
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A Study of Conventional and Junctionless MOSFET Using TCAD Simulations

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Cited by 11 publications
(4 citation statements)
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“…The junctionless dual gate MOSFET, immune to short-channel effects and possesses several unique features, is an outstanding alternative device architecture for CMOS technology [2]. The most prominent challenge in fabricating short-channel devices is forming source/channel and channel/drain junctions in typical MOSFETs [3]. Several advantageous qualities of junctionless MOSFETs include the absence of sharp junctions, which are challenging to create, a streamlined fabrication technique, and others [4].…”
Section: Introductionmentioning
confidence: 99%
“…The junctionless dual gate MOSFET, immune to short-channel effects and possesses several unique features, is an outstanding alternative device architecture for CMOS technology [2]. The most prominent challenge in fabricating short-channel devices is forming source/channel and channel/drain junctions in typical MOSFETs [3]. Several advantageous qualities of junctionless MOSFETs include the absence of sharp junctions, which are challenging to create, a streamlined fabrication technique, and others [4].…”
Section: Introductionmentioning
confidence: 99%
“…It was successfully fabricated at the Tyndall Institute by Colinge et al [4]. The major characteristic feature of this device is the absence of p-n junction which avoids the requirement of gradients in doping concentration [5]. Various analytical study of surface potential for junctionless transistor has also been done [6], [7].…”
Section: Introductionmentioning
confidence: 99%
“…These new architectures using SOI MOSFET can be the possible alternative IOP Publishing doi:10.1088/1757-899X/1228/1/012021 2 to the bulk traditional MOSFETs. The SOI MOSFETs have the intrinsic advantage of diminished area of source and drain regions and absence of depletion region beneath the source and drain which reduces leakage current and junction capacitance making these devices an attractive option for reduced power reduced-voltage applications [3][4][5].…”
Section: Introductionmentioning
confidence: 99%