2009
DOI: 10.1016/j.sse.2009.04.007
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A single-poly EEPROM cell for embedded memory applications

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Cited by 39 publications
(31 citation statements)
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“…Although this switching time is two or three orders of magnitude larger than that of commercial flash memory devices [21], it is similar to switching times of CNFETs with SiO 2 gate oxide reported by other groups [6,22]. We note that the switching time depends on the characteristic times of the charge traps in the gate oxide.…”
Section: Resultssupporting
confidence: 83%
“…Although this switching time is two or three orders of magnitude larger than that of commercial flash memory devices [21], it is similar to switching times of CNFETs with SiO 2 gate oxide reported by other groups [6,22]. We note that the switching time depends on the characteristic times of the charge traps in the gate oxide.…”
Section: Resultssupporting
confidence: 83%
“…The combined effect of Joule heating and low pressure reduces/removes adsorbates and makes it possible to analyze the effect of intrinsic defects and traps only. The complete sweeping shows a right shift of the transfer curve, creating a hysteresis that can be explained in terms of negative charge trapping [25,56,62]. Hysteretic behavior can be analyzed by the hysteresis width H W (i.e., the difference of the gate voltage values corresponding to a channel current I ds = 0.1 nA).…”
Section: Transistor Characterizationmentioning
confidence: 99%
“…For example, in the MoS 2 ‐based FETs, charge traps may arise from the trapping centers at MoS 2 /SiO 2 interface, the adsorbates on the MoS 2 channel, or from intrinsic sulfur vacancies and other crystal defects . It is highly desirable to have a comprehensive understanding of the hysteresis and achieve a good control so that it can be either eliminated to avoid threshold voltage instability or conveniently exploited, for instance, into memory devices …”
Section: Introductionmentioning
confidence: 99%