A novel silicide nanopatterning method for the fabrication of ultra-short channel Schottky-tunneling MOSFETs

Zhao, Qing‐Tai; Klinkhammer, F.; Dolle, M.; Kappius, L.; Mantl, S.

doi:10.1016/s0167-9317(99)00273-7

Cited by 6 publications

(2 citation statements)

References 12 publications

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“…[3], [4], self-cleaning structures [5], and meta-materials [6], [7]. New type semiconductor devices can be developed and the performance of conventional semiconductor devices can be improved with the help of nanopatterning [8]. One of the most promising fields of nanopatterning is the development of bit patterned magnetic media (BPM).…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Nanopatterns in a-AlO<sub>x</sub> Thin Films by a Single Laser Pulse

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Serényi

Gergely-Fülöp

et al. 2015

MSF

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Large area ordered nanopatterning of RF sputter deposited amorphous AlOxfilms has been carried out. The technique involves UV laser treatment of the samples through LB films of silica nanospheres. The hexagonal, close packed arrangement of the spheres was projected to the surface due to the laser treatment resulting in ordered structure of pits of ~200 nm diameter and 1,3 nm depth. The samples were caracterized by means of AFM and XTEM. The experimental results are in good agreement with the simulations.

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Section: Introductionmentioning

confidence: 99%

Fabrication of Nanopatterns in a-AlO<sub>x</sub> Thin Films by a Single Laser Pulse

Szívós

Serényi

Gergely-Fülöp

et al. 2015

MSF

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“…and the performance of conventional semiconductor devices can be improved with the help of nanopatterning [8]. The remarkable efforts to develop the bit patterned magnetic media (BPM) boost the improvement of various nanopatterning techniques.…”

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confidence: 99%

Nanopattern formation in UV laser treated a-AlOx and nc-Al/AlOx layers

Szívós

Serényi

Gergely-Fülöp

et al. 2014

Vacuum

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Hexagonal nanopatterns were fabricated in sputter deposited Al-oxide thin films by means of single UV laser pulses via a layer of self-assembled silica nanospheres. The hexagonal pattern was projected to the surface due to the focussing effect of the silica nanolenses enhancing the local impact of the pulse. As a result of the laser pulse large area ordered structure of nano-pits were formed in RF sputtered amorphous Al-oxide films, while nano-craters were created in DC sputter deposited layers that consist of Al nanocrystals embedded in amorphous matrix. The two different mechanisms governing the nanostructure formation in the a-AlOx and nc-Al/AlOx composite layers were revealed by Atomic Force Microscopy (AFM), cross-sectional Transmission Electron Microscopy (XTEM), spectroscopic ellipsometry and computer simulation. Abstract Hexagonal nanopatterns were fabricated in sputter deposited Al-oxide thin films by means of single UV laser pulses via a layer of self-assembled silica nanospheres. The hexagonal pattern was projected to the surface due to the focussing effect of the silica nanolenses enhancing the local impact of the pulse. As a result of the laser pulse large area ordered structure of nano-pits were formed in RF sputtered amorphous Al-oxide films, while nano-craters were created in DC sputter deposited layers that consist of Al nanocrystals embedded in amorphous matrix. The two different mechanisms governing the nanostructure formation in the a-AlO x and nc-Al/AlO x composite layers were revealed by Atomic Force Microscopy (AFM), cross-sectional Transmission Electron Microscopy (XTEM), spectroscopic ellipsometry and computer simulation.

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