1989
DOI: 10.1016/0921-5107(89)90014-7
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A novel method for simulating laser-solid interactions in semiconductors and layered structures

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Cited by 125 publications
(47 citation statements)
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“…In the case of amorphous Ge and Si, highly under cooled states have been found to occur at 241 K and 336 K below their respective melting points. [6][7][8][9][10] Under the super undercooled state of silicon, bulk nucleation of nanocrystalline silicon was directly observed, where the nanocrystallites provided seed for macrograined polycrystalline silicon, as shown in TEM micrograph of Fig. 6.…”
Section: Gementioning
confidence: 99%
See 1 more Smart Citation
“…In the case of amorphous Ge and Si, highly under cooled states have been found to occur at 241 K and 336 K below their respective melting points. [6][7][8][9][10] Under the super undercooled state of silicon, bulk nucleation of nanocrystalline silicon was directly observed, where the nanocrystallites provided seed for macrograined polycrystalline silicon, as shown in TEM micrograph of Fig. 6.…”
Section: Gementioning
confidence: 99%
“…In the case of amorphous Ge and Si, highly undercooled states have been found to occur at 241 K and 336 K below their respective melting points. 6,7 By scaling with the melting point of carbon, we estimate the undercooling in carbon to be as high as 1000 K. This undercooling can shift amorphous carbon/diamond/liquid carbon triple point to 4000 K or lower at ambient pressures. The interface temperature was estimated to be 4000 K by laser-solid interactions calculations, Simulation of Laser Interaction with Materials (SLIM) model developed by Singh and Narayan.…”
mentioning
confidence: 99%
“…These ablated species form a plasma plume containing mixture of atoms, molecules, electrons, and ions (Chrisey & Hubler, 1994;Doggett & Lunney, 2009;Lenk et al, 1996;Merlino, 2007;Singh & Narayan, 1990;Zheng et al, 1989;Wood & Giles, 1981;Caridi et al, 2008). The plasma plume expands with supersonic velocity (Singh & Narayan, 1989) and its parameters such as plasma temperature, ion density, electron density, electron temperature vary with laser parameters such as frequency, energy irradiance as well as on the background pressure (Inam et al, 1987;Neifeld et al, 1988). The laser produced plasma is highly transient in nature and its parameters vary in both space and time.…”
Section: Introductionmentioning
confidence: 98%
“…At low laser irradiance, even though the one dimensional heat flow equation 3,4 has been used to obtain satisfactory estimates of the liquid-solid position compared to experimental results 5,6 , it doesn't include the vapor plume gas dynamics necessary to calculate the vapor phase front propagation, which is more relevant to the material removal rate from the surface by the laser pulses. Another possible approach is to use the Hertz-Knudsen equation in characterizing the vaporization flux 7 , yet reasonable correspondences between theoretical estimations and experimental data for the silicon removal speed at the low irradiance regime would require the magnitudes of the saturated vapor pressure to be at least one order larger than the critical pressure, which is hard to explain with reliable physics.…”
Section: Introductionmentioning
confidence: 98%