2000
DOI: 10.1109/84.870055
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A low-power micromachined MOSFET gas sensor

Abstract: This paper reports on the design, fabrication, and characterization of the first low-power consumption MOSFET gas sensor. The novel MOSFET array gas sensor has been fabricated using anisotropic bulk silicon micromachining. A heating resistor, a diode used as temperature sensor, and four MOSFETs are located in a silicon island suspended by a dielectric membrane. The membrane has a low thermal conductivity coefficient and, therefore, thermally isolates the electronic components from the chip frame. This low ther… Show more

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Cited by 56 publications
(26 citation statements)
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“…These materials have been used in new applications in the fields of optics and nanotechnology. Chemoresistive gas sensors have been developed and widely used in industrial applications and environmental control for several decades [8][9][10]. Various gas-sensitive materials such as ZnO, SnO 2 , TiO 2 and carbon nanotubes (CNTs) have been shown to detect hazardous and combustible gases [11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…These materials have been used in new applications in the fields of optics and nanotechnology. Chemoresistive gas sensors have been developed and widely used in industrial applications and environmental control for several decades [8][9][10]. Various gas-sensitive materials such as ZnO, SnO 2 , TiO 2 and carbon nanotubes (CNTs) have been shown to detect hazardous and combustible gases [11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…Metal Oxide Semiconductor Field Effect Transistor 40 (MOSFET) is the basic building block for almost all the 41 circuits used in mobile phones [1], [2], sensors [3], [4], 42 medical instruments [5]- [7], and so on. For the past fifty 43 years Moore's law has been the driving force for technological 44 advancements in integrated circuits industry.…”
mentioning
confidence: 99%
“…10 Finally we include a recent similar device fabricated at IMT ͑Neuchâtel, Switzerland͒ that has a silicon island for a metal oxide semiconductor field effect transistor in the middle of a silicon nitride membrane ͑0.5 m͒ with a silicon oxynitride passivation layer. 11 The thermal efficiency of this device is relatively low ͑1.6°C/mW͒ and is probably due to the large size ͑1.8 mm͒, the use of aluminum metal lines and large mass of the silicon island. A related device is a polysilicon microfilament developed at Sandia National Laboratory with a very small mass and area.…”
Section: Resultsmentioning
confidence: 99%