2020
DOI: 10.1038/s41467-020-15096-0
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A FinFET with one atomic layer channel

Abstract: Since its invention in the 1960s, one of the most significant evolutions of metal-oxidesemiconductor field effect transistors (MOS-FETs) would be the three dimensionalized version that makes the semiconducting channel vertically wrapped by conformal gate electrodes, also recognized as FinFET. During the past decades, the width of fin (W fin ) in FinFETs has shrunk from about 150 nm to a few nanometers. However, W fin seems to have been levelling off in recent years, owing to the limitation of lithography preci… Show more

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Cited by 99 publications
(73 citation statements)
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“…The emergence of artificial intelligence and 5G communication requires electronics with greater computing performance and higher energy efficiency. With their abundance and the rich variety of electronic properties, the family of atomically thin two-dimensional (2D) materials is a promising choice in the next generation of very-large-scale-integration (VLSI) technology [1][2][3][4]. Electronics devices based on atomically thin 2D materials such as transition metal sulfides, black phosphorus, and graphene, have been intensively studied during the past decade.…”
Section: Introductionmentioning
confidence: 99%
“…The emergence of artificial intelligence and 5G communication requires electronics with greater computing performance and higher energy efficiency. With their abundance and the rich variety of electronic properties, the family of atomically thin two-dimensional (2D) materials is a promising choice in the next generation of very-large-scale-integration (VLSI) technology [1][2][3][4]. Electronics devices based on atomically thin 2D materials such as transition metal sulfides, black phosphorus, and graphene, have been intensively studied during the past decade.…”
Section: Introductionmentioning
confidence: 99%
“…Microelectronics revolution had being sustained by the motto “smaller is better” until the end of the geometric scaling era governed by Dennard's scaling guidelines. [ 4–6 ] Nowadays, equivalent scaling [ 7 ] based on semiconductor material substitutions [ 6,8,9 ] or/and structure innovations [ 6,9–12 ] has been extensively investigated to meet the continuously increasing high‐speed demands in modern electronics. Despite vigorous research efforts and impressive progresses, [ 6,8–13 ] severe challenges still exist in manufacturing capability limit, [ 2,7,11 ] short‐channel effect, [ 14,15 ] and heat generation.…”
Section: Introductionmentioning
confidence: 99%
“…[ 4–6 ] Nowadays, equivalent scaling [ 7 ] based on semiconductor material substitutions [ 6,8,9 ] or/and structure innovations [ 6,9–12 ] has been extensively investigated to meet the continuously increasing high‐speed demands in modern electronics. Despite vigorous research efforts and impressive progresses, [ 6,8–13 ] severe challenges still exist in manufacturing capability limit, [ 2,7,11 ] short‐channel effect, [ 14,15 ] and heat generation. [ 2 ] These challenges block operating speed enhancement for future electronic applications such as 6G wireless communication, [ 16,17 ] Internet of Things, [ 18 ] and microsystems in harsh environments.…”
Section: Introductionmentioning
confidence: 99%
“…[ 9–11 ] Recently, TMD devices having a 3D structure beyond a planar structure, and TMD circuits fabricated by wafer‐level processes have been widely studied. [ 12–14 ] Therefore, circuits based on TMD materials require further research in the fields of metal contact, patterning, encapsulation, temperature dependence, and reliability. [ 13–19 ] Since TMD devices have a large surface/volume ratio and are highly affected by charge transferring of adsorbates such as H 2 O and O 2 , encapsulation is essential.…”
Section: Introductionmentioning
confidence: 99%