2007 IEEE International Reliability Physics Symposium Proceedings. 45th Annual 2007
DOI: 10.1109/relphy.2007.369916
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A Comprehensive Model for Plasma Damage Enhanced Transistor Reliability Degradation

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Cited by 30 publications
(11 citation statements)
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“…Plasma-Induced Damage (PID) has been an important concern for equipment vendors and fabs in both traditional SiO2 based and advanced high-k dielectric based processes [1][2][3][4][5][6]. Fig.…”
Section: Introductionmentioning
confidence: 99%
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“…Plasma-Induced Damage (PID) has been an important concern for equipment vendors and fabs in both traditional SiO2 based and advanced high-k dielectric based processes [1][2][3][4][5][6]. Fig.…”
Section: Introductionmentioning
confidence: 99%
“…1 illustrates the PID phenomenon that occurs in a gate dielectric during the formation of a metal interconnect. The charge build-up in metal interconnects during the plasma processing steps introduces extra traps in the gate dielectric thereby worsening device reliability mechanisms such as Bias Temperature Instability (BTI) and Time Dependent Dielectric Breakdown (TDDB) [1][2][3]6]. The contiguous metal structure where the charge build up occurs is commonly referred to as an "antenna.…”
Section: Introductionmentioning
confidence: 99%
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