2016
DOI: 10.1109/tns.2015.2508981
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A Comparison of the SEU Response of Planar and FinFET D Flip-Flops at Advanced Technology Nodes

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Cited by 59 publications
(12 citation statements)
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“…In going from a LET of 4.0 MeV-cm 2 /mg to a LET of 17.9 MeV-cm 2 /mg, the total cross-section increased by approximately an order of magnitude. Previous measurements on 16-nm FinFET D flip-flops showed similar trends, with an appreciable increase in cross-section for a similar LET range [14,15]. In those studies, this was contrasted with bulk technologies, which didn't show as dramatic an increase in cross-section in the same LET range.…”
Section: Tamu Experiments and Simulation Analysismentioning
confidence: 68%
“…In going from a LET of 4.0 MeV-cm 2 /mg to a LET of 17.9 MeV-cm 2 /mg, the total cross-section increased by approximately an order of magnitude. Previous measurements on 16-nm FinFET D flip-flops showed similar trends, with an appreciable increase in cross-section for a similar LET range [14,15]. In those studies, this was contrasted with bulk technologies, which didn't show as dramatic an increase in cross-section in the same LET range.…”
Section: Tamu Experiments and Simulation Analysismentioning
confidence: 68%
“…Thus, the FinFET sensitive area is reduced. However, FinFET SET improvement decreases for LET ≥ 10 MeV-cm 2 /mg as shown in [5]. In that same work, it is recommended that radiationhardening techniques should be taken into consideration before FinFET-based circuits are potentially used in space missions Bulk and SOI FinFET SRAM cells have comparable critical charges, but the larger collection volume of the bulk cell may result in upsets for lower linear energy transfer (LET) particles, as well as a larger sensitive area (SEU cross section).…”
Section: Introductionmentioning
confidence: 94%
“…This can be resolved through a device reboot or data rewriting. However, in devices such as very-large-scale integration (VLSI) devices, small flip-flop errors can cause critical issues [4][5][6][7].…”
Section: Introductionmentioning
confidence: 99%