A chemically amplified molecular glass resist with an ionic photoacid generator and a single protection group

Abstract

A molecular glass resist with an ionic photoacid generator and a single protection group (MR‐1) has been developed. MR‐1 exhibited good thermal properties, such as a 5% weight loss temperature (Td5%) of 167°C and a glass transition temperature (Tg) of 80°C. MR‐1 showed the good sensitivity of 80 μC/cm2 and high contrast of 4.9 with e‐beam exposure (50 keV). A relatively high resolution of 50 nm and low Line‐Edge‐Roughness of 3.8 nm were obtained by e‐beam exposure (100 keV). © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2014, 131, 39769.

A convenient one-pot preparation of spiro[fluorene-9,9’-xanthene]-3’,6’-diol derivatives

“…[31][32][33][34] As an important class of spirofluorene derivatives, spiro[fluorene-9,9'-xanthene] (SFX) has also received much attention in recent years ( Figure 1). [35][36][37][38][39][40][41] In the early literatures, SFXs were arduously synthesized by means of multistep routes with poor yield. 42,43 Spiro[fluorene-9,9'-xanthene]-3',6'-diol derivatives can be obtained via the condensation reaction of 9-fluorenones with resorcinol using ZnCl 2 /HCl 37,44 or gaseous HCl …”