2011 IEEE International Solid-State Circuits Conference 2011
DOI: 10.1109/isscc.2011.5746413
|View full text |Cite
|
Sign up to set email alerts
|

A 1.2V 12.8GB/s 2Gb mobile Wide-I/O DRAM with 4×128 I/Os using TSV-based stacking

Abstract: Mobile DRAM is widely employed in portable electronic devices due to its feature of low power consumption. Recently, as the market trend renders integration of various features in one chip, mobile DRAM is required to have not only low power consumption but also high capacity and high speed. To attain these goals in mobile DRAM, we designed a 1Gb single data rate (SDR) Wide-I/O mobile SDRAM with 4 channels and 512 DQ pins, featuring 12.8GB/s data bandwidth. Figure 28.5.1 shows the chip architecture with 4-chann… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
62
0

Year Published

2011
2011
2019
2019

Publication Types

Select...
7
3

Relationship

0
10

Authors

Journals

citations
Cited by 69 publications
(63 citation statements)
references
References 3 publications
1
62
0
Order By: Relevance
“…Solutions include contactless test [109] or inserting additional probing pads to non-bottom dies at the cost of increased area [110]. Another concern is whether to perform the test before or after wafer thinning [111].…”
Section: Pre-bond Testingmentioning
confidence: 99%
“…Solutions include contactless test [109] or inserting additional probing pads to non-bottom dies at the cost of increased area [110]. Another concern is whether to perform the test before or after wafer thinning [111].…”
Section: Pre-bond Testingmentioning
confidence: 99%
“…This baseline uses a relatively large interposer, but this still fits within an assumed reticle limit of 24mm×36mm (8.6cm 2 ). Each of the four memory stacks is assumed to have a size similar to a JEDEC Wide-IO DRAM [23], [27], and we assume four channels per stack. The chip-to-chip and chip-to-interposer edge spacing is assumed to be 0.5mm.…”
Section: A Baseline System and Nocmentioning
confidence: 99%
“…Architecture option (a) is very similar to the published Wide-IO device of Samsung [25]. The areas with tile size numbers in Figure 2 show the DRAM cell arrays, the areas with stripes are occupied by column, row and control circuits, as well as all other peripheral circuits, and the remaining areas are reserved for the vertical TSV connections as indicated in the figure.…”
Section: Mobile Dram Generationsmentioning
confidence: 99%