By
using pulse electrodeposition, a copper nanopillar array (CuNPA)
was filled into porous anodized aluminum oxide (AAO) films to achieve
a highly thermal conductive interconnector with anisotropic property.
After 120 min pulse deposition, CuNPA uniformly filled the pores of
AAO with a pore-filling percentage of 99.4%, as the ion concentration
in AAO pores can re-equilibrate to electrolyte concentration during
the current-off period. The CuNPA-filled AAO film showed a high thermal
conductivity of 153.12 W/(m·K) in the vertical direction and
a low thermal conductivity of 3.43 W/(m·K) in the horizontal
direction. Hence, the anisotropic ratio of the thermal conductivity
reached 44.64. Moreover, the fabrication process was facile and cost-effective,
showing a potential application prospect in the field of high-density
packages and power electronic devices.