2002
DOI: 10.1590/s0103-97332002000400020
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Capacitance-voltage characteristics of InAs dots: a simple model

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Cited by 2 publications
(4 citation statements)
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“…The method for calculating the capacitance dependence was proposed to compare with the experimental results. [7][8][9] Particularly, in the work of Chiquito et al, 9 a negative differential capacitance ͑NDC͒ characteristic was observed at low temperatures and a model was provided to explain the results. However, in the consideration of practical application, such as quantum dot memory devices, the operation temperature has to be much higher.…”
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confidence: 99%
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“…The method for calculating the capacitance dependence was proposed to compare with the experimental results. [7][8][9] Particularly, in the work of Chiquito et al, 9 a negative differential capacitance ͑NDC͒ characteristic was observed at low temperatures and a model was provided to explain the results. However, in the consideration of practical application, such as quantum dot memory devices, the operation temperature has to be much higher.…”
mentioning
confidence: 99%
“…That is, the n dot in formula ͑4͒ is nearly zero and thereby the ͑x͒ would tend to be classical. 8,9 When the applied reverse voltage decreases, the Fermi level E f approaches to the first energy level E dot1 and it leads to filling ground energy states with electrons. As a result, n dot1 increases as follows:…”
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confidence: 99%
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“…The distinct behaviours of the capacitance in QWR undoped devices can be related to a two-dimensional electron gas (2DEG) formation as a result of electron localisation in the InGaAs wetting layer (WL). Chiquito et al [27] observed a plateau-like dependence in their C-V measurements at the bias range 0.5 to 1.5 V in an InAs/ GaAs self-assembled QD system. They related this behaviour to the formation of 2DEG at the (GaAs) 4 /(AlAs) 11 /GaAs top interface rather than at the WL because their PL and Raman scattering measurements proved that there was no contribution of the WL.…”
Section: C-v Characteristicsmentioning
confidence: 99%