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It is well known that the production of semiconductors and chips with required parameters and properties is based on ion beam technology. However, the industrial use of ion beams still remains a problem because it requires a high rate and homogeneous treatment of the samples of complex configuration. Plasma technologies can make an efficient contribution to improving the tribological and corrosion characteristics of the most important workpieces for industrial machines. In the present report, consideration is given to the high voltage discharge of 3DII type at the pressure of 0.2–0.9 Pa with 10–30 kV pulse length of 0.25 ms and the repetition frequency of 30 Hz. We have defined such characteristics of the discharge as the volt-ampere curve at the mentioned pressure range, the range of discharge existence, and the thickness of the cathode sheath. The comparison of the profiles of implanted nitrogen ions at 10 kV pulse voltage obtained by the secondary ion mass spectroscopy CAMECA method with the results of the TRIM simulation, as well as the analysis of the voltage and current discharge pulses demonstrate that the ion flux incident on the workpiece is quasimonoenergetic and the angle of surface bombardment is normal.

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