High voltage pulse discharge for ion treatment of metals

Abstract

It is well known that the production of semiconductors and chips with required parameters and properties is based on ion beam technology. However, the industrial use of ion beams still remains a problem because it requires a high rate and homogeneous treatment of the samples of complex configuration. Plasma technologies can make an efficient contribution to improving the tribological and corrosion characteristics of the most important workpieces for industrial machines. In the present report, consideration is given to the high voltage discharge of 3DII type at the pressure of 0.2–0.9 Pa with 10–30 kV pulse length of 0.25 ms and the repetition frequency of 30 Hz. We have defined such characteristics of the discharge as the volt-ampere curve at the mentioned pressure range, the range of discharge existence, and the thickness of the cathode sheath. The comparison of the profiles of implanted nitrogen ions at 10 kV pulse voltage obtained by the secondary ion mass spectroscopy CAMECA method with the results of the TRIM simulation, as well as the analysis of the voltage and current discharge pulses demonstrate that the ion flux incident on the workpiece is quasimonoenergetic and the angle of surface bombardment is normal.

Aplicación de descargas simultáneas de alto voltaje y arco eléctrico para el tratamiento superficial avanzado de metales.

“…Resumen-La implantación iónica tridimensional (3DII) [1] es una técnica de tratamiento superficial avanzado [2], la cual es realizada en el dispositivo JUPITER (Joint Universal Plasma and Ion Technologies Experimental Reactor) [3] mediante una descarga pulsada de alto voltaje a bajas presiones en un gas encendida en la rama izquierda de la curva de Paschen [4]- [5], cuyo objetivo principal es mejorar las propiedades tribológicas. Para la protección superficial de materiales expuestos en medios agresivos se realiza la modificación del dispositivo JUPITER que consiste en la instalación en de un vaporizador de arco eléctrico en la cámara de descarga [6].…”

Estimate of the concentration of implanted ions in solid substrates using a web application

“…The reactor JUPITER (Join Universal of Plasma and Ion Technologies Experimental Reactor) [9] is the only equipment built based on this technology that allow the implantation of ions in solid substrates of metallic and non-metallic species. The parameters that characterize the implementation are: the ion's type, the ion's energy and the implanted dose [1,2,[10][11][12].…”

“…The modification superficial consists in alter the composition and structure of materials either by creating a coating (with typical thicknesses of a few microns) or by introducing new elements into the surface (dopant ions) in nanometric depths [1].…”

“…The reactor JUPITER (Join Universal of Plasma and Ion Technologies Experimental Reactor) [9] is the only equipment built based on this technology that allow the implantation of ions in solid substrates of metallic and non-metallic species. The parameters that characterize the implementation are: the ion's type, the ion's energy and the implanted dose [1,2,[10][11][12].The calculation of superficial density of ions implanted in some material depends mainly of time of treatment, density of ionic current, repetition frequency and pulse duration, the secondary emission ion-electron coefficient of material and the area of the cathode. This paper presents a computational tool, which allows us estimate the value for implanted dose on the surface of solid substrates after a process of surface modification by ion 3DII.…”

A new method for surface modifications of carbon steels and alloys

“…In this area, we have started with the gas ion implantation study [1][2][3][4] . The implantation is performed through high voltage pulse discharges ignited in the JUPITER reactor which is set up in Plasma Physics Laboratory at the Universidad Industrial de Santander (Colombia).…”