1997
DOI: 10.1016/s0257-8972(97)00117-5
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The use of a high-voltage discharge at low pressure for 3D ion implantation

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Cited by 29 publications
(24 citation statements)
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“…The reactor JUPITER (Join Universal of Plasma and Ion Technologies Experimental Reactor) [9] is the only equipment built based on this technology that allow the implantation of ions in solid substrates of metallic and non-metallic species. The parameters that characterize the implementation are: the ion's type, the ion's energy and the implanted dose [1,2,[10][11][12].…”
Section: Introductionmentioning
confidence: 99%
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“…The reactor JUPITER (Join Universal of Plasma and Ion Technologies Experimental Reactor) [9] is the only equipment built based on this technology that allow the implantation of ions in solid substrates of metallic and non-metallic species. The parameters that characterize the implementation are: the ion's type, the ion's energy and the implanted dose [1,2,[10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…The three-dimensional ion implantation (3DII) [2] is a superficial modification process generated by high voltage discharges at low pressures, which turns on in the left branch of the Paschen curve, and it is used as an alternative to improve physical and chemical properties of materials [3][4][5][6]. The pioneers in the study of this type of discharge were Klarfeld and Pokrovskaya-Soboleva [7] and McClure [8].…”
Section: Introductionmentioning
confidence: 99%
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“…This modified reactor is named MOSMET 5 . It is significant that the MOSMET reactor permits not only to deposit metal vapor or molecules (such as TiN 2 ) on the surface through the arc discharge or the ion implantation through the high voltage discharge but also to give a hybrid treatment which is realized at simultaneous functioning of the electric arc discharge and the high voltage discharge related to the left branch of the Paschen curve 6,7 . The hybrid treatment of metals which modifies the structure of their surface and sub-surface layers can improve such characteristics as the surface microhardness and resistance to corrosion including resistance to corrosion produced by biologic species 8,9 .…”
Section: Introductionmentioning
confidence: 99%
“…Resumen-La implantación iónica tridimensional (3DII) [1] es una técnica de tratamiento superficial avanzado [2], la cual es realizada en el dispositivo JUPITER (Joint Universal Plasma and Ion Technologies Experimental Reactor) [3] mediante una descarga pulsada de alto voltaje a bajas presiones en un gas encendida en la rama izquierda de la curva de Paschen [4]- [5], cuyo objetivo principal es mejorar las propiedades tribológicas. Para la protección superficial de materiales expuestos en medios agresivos se realiza la modificación del dispositivo JUPITER que consiste en la instalación en de un vaporizador de arco eléctrico en la cámara de descarga [6].…”
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