The structure and dielectric properties of (As 2 S 3 ) 100−x (SbSI) x glasses and their transformation during the heat treatment have been investigated. It has been determined that all glassy alloys have a microgeterogeneous structure. It has been shown that anomalies on the temperature dependences of dielectric permittivity ε and tg δ are connected with the transition of glasses into a polar state followed by their crystallization. The crystallization of glasses is accompanied by a sharp increase in dielectric parameters conditioned by the formation of nanocrystalline inclusions in the glassy matrix which have ferroelectric properties. The structure arising in (As 2 S 3 ) 100−x (SbSI) x (50 < x < 100) glass matrix during its crystallization corresponds to that of crystalline SbSI. The size of crystalline inclusions and dielectric permittivity value of ferroelectric glass-ceramic depend on the heat treatment conditions.
Two types of amorphous functional materials, based on light‐sensitive inorganic compounds like Se and As20Se80 chalcogenide glass (ChG) were investigated with the aim to establish the influence of plasmonic fields, excited by the recording light in nanocomposite layers made of these compounds and gold nanoparticles on their photomechanical response. Both these basic materials are characterized by pronounced photoplastic effect and used for real‐time optical recording of optoelectronic elements (based mainly on surface relief gratings) due to high photofluidity and polarization‐dependent mass‐transport. We have established that mass‐transport processes in these ChG can be enhanced in the presence of localized plasmonic fields generated by light if the condition of surface plasmon resonance (SPR) is fulfilled. The subjects of special interest are the mass‐transport processes at nano‐scale stimulated in the nano‐composite layers either by uniform or periodically distributed optical fields. It was found that irradiation by light in the presence of SPR really enhanced the efficiency of mass‐transport and produced surface nanostructurizations. The variation in the topography follows closely and permanently the underlying near field intensity pattern.
Nanostructurization of photosensitive amorphous As20Se80 film by surface plasmon near field irradiation.
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