This work is devoted to measuring the function of the distribution of charged particles of gas-discharge plasma in a magnetron sputtering system under conditions of non-potential "earth". Measurements are carried out with the help of a three-electrode probe, which is installed in the cathode sputtering zone, with unsafe electrodes and housing. The selection of the analyzed particles was carried out through a screen located under floating potential. Effect of additional magnetic insulation anode of MSS МАG-5 on ion and electron distribution functions was investigated.
Paper presents results of evaluation of the influence of the parameters of the additional anode electromagnetic trap for discharge electrons in a magnetron sputtering system. The efficiency of ionization processes is also investigated. It has been shown experimentally that a slight increase of the additional anode magnetic field leads to an increase of plasma density in the discharge on several times. The presence of an anode electromagnetic trap
causes additional ionization zones. An increase of anode magnetic field leads to an increase of the average energy of charged discharge plasma particles. As the result, it was observed an intensification of the target material sputtering process as well as an increase of coatings deposition rate. In addition, a slight increase in the magnitude of the anode
magnetic field has a positive effect on the quality and purity of the deposited coatings.
Experimental studies of surface modification of Eurofer samples have been performed with a quasi-stationary plasma accelerator QSPA Kh-50. The heat load on the surface was near the tungsten melting threshold (i.e. about 0.6 MJ/m2). The plasma streams exposures result in modification of steel-based materials and formation of cellular submicron structures in re-solidified layers. Phase characterized by body-centered cubic lattice appeared due to recrystallization of affected material.
The work is devoted to improvement of magnetron discharge parameters based on a standard magnetron sputtering system (MSS) of the MAG-5 type with an additional anode magnetic trap for discharge electrons in the conditions of localization of the discharge zone in the gap between electrodes to prevent charged particles losses. Possibilities of such configuration of MSS for depositing of coatings of materials with low coefficient of sputtering (tungsten) are investigated. The increase of the coating rate has been demonstrated. The mass of the deposited tungsten increased by more than 35 % compared to the use of the same MSS without additional anode magnetic trap.
3lP16Pulsed discharges were xcoiiiplishetl by firing a capacitor bank of 24 IIF. The chargiiig voltages of the capacitor bank were 3 N 10 kV. The voltages were usually fed to the anode
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