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Wafer Defect Classification (WDC) can be crucial to the wafer fabrication process. Engineers can quickly respond to improve the technological process, averting further defects through WDC. However, due to the complex fabrication steps, wafer defects are different in various types. This causes a severe data imbalance problem in WDC. To effectively solve the problem, this study introduces a class imbalanced wafer defect classification framework (CI-WDC) based on Variational Autoencoder Generative Adversarial Network (VAE-GAN). This framework consists of VAE-GAN and wafer defect classifier. Among them, VAE-GAN is responsible for creating new samples to solve the imbalance problem while the classifier is responsible for classifying wafer defect patterns. Specifically, VAE-GAN combines the advantage of a variational autoencoder (VAE) and generative adversarial network. VAE networks can produce subtle differences that do not affect the properties of the data when generating new images. At the same time, the proposed discriminator can help us constrain the generated images to be close to real samples and avoid irrational, feature-missing, and ambiguous samples. WM-811K dataset is utilized to verify the above method. The experimental results validate that the samples generated by VAE-GAN have a significant improvement in the performance of the WDC system.

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Despite recent advances in deep learning-based face frontalization methods, photo-realistic and illumination preserving frontal face synthesis is still challenging due to large pose and illumination discrepancy during training. We propose a novel Flow-based Feature Warping Model (FFWM) which can learn to synthesize photo-realistic and illumination preserving frontal images with illumination inconsistent supervision. Specifically, an Illumination Preserving Module (IPM) is proposed to learn illumination preserving image synthesis from illumination inconsistent image pairs. IPM includes two pathways which collaborate to ensure the synthesized frontal images are illumination preserving and with fine details. Moreover, a Warp Attention Module (WAM) is introduced to reduce the pose discrepancy in the feature level, and hence to synthesize frontal images more effectively and preserve more details of profile images. The attention mechanism in WAM helps reduce the artifacts caused by the displacements between the profile and the frontal images. Quantitative and qualitative experimental results show that our FFWM can synthesize photo-realistic and illumination preserving frontal images and performs favorably against the state-of-the-art results. Our code is available at https://github.com/csyxwei/FFWM.