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Zr-Si-N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr-Si-N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films' hardness and Young's modulus exhibited an evident relationship to their compressive residual stresses. The films with 2-6 at.% Si exhibited high hardness of 33-34 GPa and high Young's moduli of 346-373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa.

High-Si-content transition metal nitride coatings, which exhibited an X-ray amorphous phase, were proposed as protective coatings on glass molding dies. In a previous study, the Zr-SiN coatings with Si contents of 24-30 at.% exhibited the hardness of Si 3 N 4 , which was higher than those of the middle-Si-content (19 at.%) coatings. In this study, the bonding characteristics of the constituent elements of Zr-SiN coatings were evaluated through X-ray photoelectron spectroscopy. Results indicated that the Zr 3d 5/2 levels were 179.14-180.22 and 180.75-181.61 eV for the Zr-N bonds in ZrN and Zr 3 N 4 compounds, respectively. Moreover, the percentage of Zr-N bond in the Zr 3 N 4 compound increased with increasing Si content in the Zr-SiN coatings. The Zr-N bond of Zr 3 N 4 dominated when the Si content was >24 at.%. Therefore, high Si content can stabilize the Zr-N compound in the M 3 N 4 bonding structure. Furthermore, the thermal stability and chemical inertness of Zr-SiN coatings were evaluated by conducting thermal cycle annealing at 270 • C and 600 • C in a 15-ppm O 2-N 2 atmosphere. The results indicated that a Zr 22 Si 29 N 49 /Ti/WC assembly was suitable as a protective coating against SiO 2-B 2 O 3-BaO-based glass for 450 thermal cycles.

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