We design and demonstrate broadband directional couplers that use asymmetric-waveguide based phase control sections, on the silicon-on-insulator platform. Broadband directional couplers with various power splitting ratios, including 10%/90%, 20%/80%, 30%/70%, 40%/60% and 50%/50%, were realized for both transverse electric (TE) and transverse magnetic (TM) modes. Some of the devices exhitbit bandwidths in excess of 100 nm, and all in excess of 75 nm. The footprints of the TE mode couplers are 32 μm ×1.3 μm, or less, and those of the TM mode couplers are 13 μm ×1.3 μm, or less.
We experimentally demonstrate compact, broadband directional couplers using sub-wavelength gratings for silicon-on-insulator wafers with silicon layers of 220nm. The dispersion properties of the optical modes are engineered using sub-wavelength gratings, which allows broadband operation. Finite-difference time-domain based band structure calculations, with significantly reduced simulation time, were used to analyze the design, which included both the structure and the material dispersions. Compact broadband direction couplers, with device lengths shorter than 14µm, which cover a bandwidth of 100nm, for power splitting ratios of 50/50, 40/60, 30/70, and 20/80, are designed and fabricated for the fundamental transverse electric mode with a central operating wavelength of 1550nm.
We demonstrate the realization of plasmonic analog of electromagnetically induced transparency (EIT) in a system composing of two stub resonators side-coupled to metal-dielectric-metal (MDM) waveguide. Based on the coupled mode theory (CMT) and Fabry-Perot (FP) model, respectively, the formation and evolution mechanisms of plasmon-induced transparency by direct and indirect couplings are exactly analyzed. For the direct coupling between the two stub resonators, the FWHM and group index of transparent window to the inter-space are more sensitive than to the width of one cut, and the high group index of up to 60 can be achieved. For the indirect coupling, the formation of transparency window is determined by the resonance detuning, but the evolution of transparency is mainly attributed to the change of coupling distance. The consistence between the analytical solution and finite-difference time-domain (FDTD) simulations verifies the feasibility of the plasmon-induced transparency system. It is also interesting to notice that the scheme is easy to be fabricated and may pave the way to highly integrated optical circuits.
We demonstrate spiral Bragg grating waveguides (BGWs) on the silicon-on-insulator (SOI) platform for the fundamental transverse magnetic (TM) mode. We also compare TM spiral waveguides to equivalent transverse electric (TE) spiral waveguides and show that the TM spiral waveguides have lower propagation losses. Our spiral waveguides are space-efficient, requiring only areas of 131×131 µm(2) to accommodate 4 mm long BGWs, and, thus, are less susceptible to fabrication non-uniformities. Due to the lengths and reduced susceptibility to fabrication non-uniformities, we were able to obtain narrow bandwidth, large extinction ratio (ER) devices, as narrow as 0.09 nm and as large as 52 dB, respectively. Finally, we demonstrate a 4 mm long TM chirped spiral Bragg grating waveguide with a negative, average, group delay slope of -11 ps/nm.
We design and demonstrate a wideband silicon photonic polarization beamsplitter on a silicon-on-insulator platform. The device consists of two 3 dB broadband couplers cascaded in a point-symmetric network. The transverse electric (TE) and transverse magnetic (TM) modes are coupled to different output ports due to a large difference between their coupling strengths. The device exhibits large isolation at both the two output ports, of more than 20 dB over a large bandwidth of 125 nm, and a small excess loss, of less than 0.5 dB for the entire C-band.
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