TiO2 films with high crystallinity were produced by inductively coupled plasma (ICP)‐assisted reactive magnetron sputtering without extra heating of the substrate. In spite of the low process temperature, the deposition rate was >400 min−1 and the polycrystalline anatase phase was obtained. The TiO2 films were characterized by X‐ray diffraction (XRD), Auger electron spectroscopy (AES), and Rutherford back‐scattering spectrometry (RBS). The photocatalytic ability of the TiO2 film was analyzed by measuring the photocurrent and decomposition rate of methylene blue. The photocatalytic ability of anatase effectively decomposed methylene blue and generated a photocurrent of over 0.2 mA · cm−2 in UV condition. The maximum open circuit voltage (Voc) was about 0.520 V.
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