Van der Waals heterostructures built from two-dimensional materials on a conventional semiconductor offer novel electronic and optoelectronic properties for next-generation information devices. Here we report that by simply stacking a vapor-phase-synthesized multilayer n-type WS2 film onto a p-type Si substrate, a high-responsivity Zener photodiode can be achieved. We find that above a small reverse threshold voltage of 0.5 V, the fabricated heterojunction exhibits Zener tunneling behavior which was confirmed by its negative temperature coefficient of the breakdown voltage. The WS2/Si heterojunction working in the Zener breakdown regime shows a stable and linear photoresponse, a broadband photoresponse ranging from 340 to 1100 nm with a maximum photoresponsivity of 5.7 A/W at 660 nm and a fast response speed of 670 μs. Such high performance can be attributed to the ultrathin depletion layer involved in the WS2/Si p-n junction, on which a strong electric field can be created even with a small reverse voltage and thereby enabling an efficient separation of the photogenerated electron-hole pairs.

Monolayer MoS is considered to be one of the best candidates for next generation electronics because of its ultra-thin body and direct band gap. However, MoS based transistors have relatively low photoresponsivity, field effect mobility and narrow response spectrum range, which hinder the application of MoS in optoelectronic devices. Here, based on the enhancement of localized surface plasmon resonance (LSPR), a simple method of depositing Ag nanoparticles on the MoS surface is used. By adjusting the size of Ag nanoparticles, the response spectral range of phototransistor is broadened from red to near ultra-violet. The photoresponsivity gains an increase of 470% up to 2.97 × 10 A W at 610 nm, and the response time also shows a decrease to some extent. The enhanced responsivity is comparable to those of devices encapsulated with high-quality dielectrics, and superior over other reported monolayer MoS in ambient conditions. The high responsivity and working current enables a wide range of device applications. This work provides a viable route towards performance enhancement of two-dimensional phototransistors.

Non-polar a-plane n-ZnO/p-AlGaN and n-ZnO/i-ZnO/p-AlGaN heterojunction film light-emitting diodes (LEDs) are fabricated with good crystalline quality. The optical measurements show obvious performance enhancement with i-ZnO layer insertion. Off-axis electron holography reveals a potential drop of ∼1.5 V across the heterojunctions with typical p-n junction characteristics. It is found that the electrostatic potentials are inclined and the corresponding electrostatic fields are opposite to each other in n-ZnO and p-AlGaN regions. The electrostatic fields are mainly attributed to strain induced piezoelectric polarizations. After an insertion of an i-ZnO layer into the p-n heterojunction, comparatively flat electrostatic potential generates in the intrinsic ZnO region and contributes to faster movements of the injected electrons and holes, making the i-ZnO layer more conductive to the radiative recombination with enhanced exciton recombination possibilities and at last the LED performance enhancement.