We present a study of the hole emission processes in InAs/GaAs quantum dots using capacitance and admittance spectroscopies. From the conductance mapping, the hole levels show a quasicontinuous distribution, instead of the clear shell structures that have been observed in electron systems. According to a comparative analysis of the capacitance and admittance spectroscopies, the hole emission process is identified to be via thermally activated tunneling through the wetting layer as an intermediate state. An energy level diagram of the quantum dot is also constructed, which shows the hole in our quantum dots to be more weakly confined. We propose a general thermally activated tunneling model to explain our results and those in other works. The conclusion is that both the localization energy and the electric field are important for the carrier emission processes. This model is further extended to predict which carrier type ͑i.e., electron or hole͒ will be more relevant during the exciton dissociation processes in quantum dots.
The influence of SiO2 and Si3N4 dielectric matrices on the structural, phonon, luminescence and thermal properties of Ge quantum dots (QDs) has been experimentally investigated. Compared with the case of QDs in SiO2 layers, Si3N4 matrix imposes large interfacial surface energy on QDs and enhances their Ostwald ripening rate, appearing to be conducive for an improvement in crystallinity and a morphology change to a more perfectly spherical shape of Ge QDs. Quantum confinement induced electronic structure modulation for Ge QDs is observed to be strongly influenced not only by the QD size but also by the embedded matrix. Both matrix and surface effects offer additional mechanisms to QD itself for controlling the optical and thermal properties of the QDs.
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