Homogeneous and quasiamorphous lithium fluoride based films have been deposited as a new ultrahigh resolution electron beam resist. The exposure characteristics of this self-developing positive tone resist are discussed. Compared to other metal halide films, a high sensitivity is the most important advantage, while the resolution limit is also far below 10 nm. Concerning pattern transfer, the properties of this resist in various reactive ion etch processes and the capability for a lift-off process were investigated.
Magnetoconductance experiments on metallic nanobridges were performed in a mesoscopic twoprobe con6guration. In our samples a short wire of length L = 100 nm to L = 1 p,m and cross section 30 x 30 nm connected two funnel-shaped contacts. The contacts served as both voltage and current leads. The dependence of conductance Suctuations (CF's) on the length of the mesoscopic wires was measured at temperatures T ( 100 mK. In this temperature range the rms amplitude bG of the CF equals its low-temperature value for all investigated devices. Magnetoconductance Suctuations are caused by the interference of electrons within a phase coherent area I"~. In short bridges F~e ncloses the nanometer wire and parts of the funnel-shaped contacts. Quantuxn diffusion of conduction electrons into the contacts leads to high-frequency magneto-CF. The diffusion in the wide contact regions becomes more and more important with decreasing wire length. This results in a decreasing correlation 6eld B, with decreasing wire length. We observed a weak dependence of the rms amplitude bG of the CF on the wire length, which we attribute to a dimensional crossover from a one-dimensional (1D) to a 2D systexn. Besides the saturation value of bG we studied the temperature dependence of CF's in the range 280 mK to 10 K for a L = 200 nm wire. The decrease of the magnitude of the CF starts only at T ) 500 mK. For higher temperatures it follows a T law.
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