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The adhesion of iron films to single crystal Al2O3 substrates was investigated using a pull test. Chromium (300 keV) or nickel (340 keV) ions were implanted to a fluence of 1 × 1015 ions-cm-2 after film deposition. The adhesion test results were widely scattered due to a random distribution of interfacial flaw sizes controlling the failure nucleation. Because Weibull statistics were developed to describe the failure probability due to a population of flaw-initiated cracks, the Weibull distribution was chosen to analyze the data. Modifications in the adhesion strength due to the ion implantation were reflected in the failure distributions. It was found that the chromium ions improved the adhesion of the Fe/Al2O3 system while the implantation of nickel did not.

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