It is shown that in Au/InGaP and Au/InGaAlP Schottky diodes the Fermi level is pinned by metal-deposition-induced midgap states. Hydrogen plasma treatment of such diodes greatly improves the reverse currents. The measured Schottky barrier heights seem to correlate with the valence band offsets measured by DLTS on quantum well structures.
It is shown that the low electrical activity of Zn in MOCVDgrown InGaAlP is related to hydrogen passivation during growth and that the effect is sensitive to growth conditions. We also discuss the results of hydrogen plasma treatment of p- and n-InGaAlP layers.
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