We report about a detailed comparison of the additive manufacturing methods inkjet printing (IJP) and aerosol jet printing (AJP). Both technologies are based on the direct-writing approach enabling the non-contact deposition of various materials in flexible patterns, e.g., for printed electronic applications. The deposited pattern elements were classified as (i) drops (IJP) or splats (AJP), (ii) lines, and (iii) squares. These elements can be considered as basic elements of the deposition systems and also of printed electronics. The pattern elements were deposited with IJP and AJP using the same silver nanoparticle ink. After printing, the layers were characterized regarding their morphology by optical and topographical measurement methods as well as regarding their electrical characteristics. It turned out that drops deposited with IJP and splats deposited with AJP can have similar dimensions. However, the shapes of the deposits differ widely. In the case of lines, AJP enables narrower line widths and thinner line thicknesses in comparison to IJP. In IJP, the line morphology varies depending on the direction of the deposition. Finally, the morphology of the deposited lines determines the electrical conductivity. For printed squares, the IJP layers show much higher layer thickness and a different layer topography compared with AJP as result of a higher volume per area deposition of materials
We present a wafer-level vacuum-packaged (WLVP) translatory micro-electro-mechanical system (MEMS) actuator developed for a compact near-infrared-Fourier transform spectrometer (NIR-FTS) with 800–2500 nm spectral bandwidth and signal-nose-ratio (SNR) > 1000 in the smaller bandwidth range (1200–2500 nm) for 1 s measuring time. Although monolithic, highly miniaturized MEMS NIR-FTSs exist today, we follow a classical optical FT instrumentation using a resonant MEMS mirror of 5 mm diameter with precise out-of-plane translatory oscillation for optical path-length modulation. Compared to highly miniaturized MEMS NIR-FTS, the present concept features higher optical throughput and resolution, as well as mechanical robustness and insensitivity to vibration and mechanical shock, compared to conventional FTS mirror drives. The large-stroke MEMS design uses a fully symmetrical four-pantograph suspension, avoiding problems with tilting and parasitic modes. Due to significant gas damping, a permanent vacuum of ≤3.21 Pa is required. Therefore, an MEMS design with WLVP optimization for the NIR spectral range with minimized static and dynamic mirror deformation of ≤100 nm was developed. For hermetic sealing, glass-frit bonding at elevated process temperatures of 430–440 °C was used to ensure compatibility with a qualified MEMS processes. Finally, a WLVP MEMS with a vacuum pressure of ≤0.15 Pa and Q ≥ 38,600 was realized, resulting in a stroke of 700 µm at 267 Hz for driving at 4 V in parametric resonance. The long-term stability of the 0.2 Pa interior vacuum was successfully tested using a Ne fine-leakage test and resulted in an estimated lifetime of >10 years. This meets the requirements of a compact NIR-FTS.
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