Compound optics such as lens systems can overcome the limitations concerning resolution, efficiency, or aberrations which fabrication constraints would impose on any single optical element. In this work we demonstrate unprecedented sub-5 nm point focusing of hard x-rays, based on the combination of a high gain Kirkpatrick-Baez (KB) mirror system and a high resolution W/Si multilayer zone plate (MZP) for ultra-short focal length f. The pre-focusing allows limiting the MZP radius to below 2 μm, compatible with the required 5 nm structure width and essentially unlimited aspect ratios, provided by enabling fabrication technology based on pulsed laser deposition (PLD) and focused ion beam (FIB).

We have used a combined optical system of a high gain elliptic Kirkpatrick-Baez mirror system (KB) and a multilayer Laue lens (MLL) positioned in the focal plane of the KB for hard x-rays nano-focusing. The two-step focusing scheme is based on a high acceptance and high gain elliptical mirror with moderate focal length and a MLL with ultra-short focal length. Importantly, fabrication constraints, i.e. in mirror polishing and bending, as well as MLL deposition can be significantly relaxed, since (a) the mirror focus in the range of 200-500 nm is sufficient, and (b) the number of layers of the MLL can be correspondingly small. First demonstrations of this setup at the coherence beamline of the PETRA III storage ring yield a highly divergent far-field diffraction pattern, from which the autocorrelation function of the near-field intensity distribution was obtained. The results show that the approach is well suited to reach smallest spot sizes in the sub-10nm range at high flux

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X-ray diffractive techniques using Fresnel zone plate lenses of various forms are of great technical interest because of their ability to form images at very high spatial resolution, but the zone plates are unfortunately very hard to produce by lithography. Alternatively, multilayer Laue lenses (MLLs) and multilayer zone plates are used due to the higher and easily adjustable aspect ratio necessary for different wavelengths. In this paper, the fabrication of a MLL by a combination of pulsed laser deposition and focused ion beam machining is described. All steps of the production of a Ti/ZrO(2) microlens test structure with focal length of 220 microm (for a wavelength of 2.88 nm in the "water window" regime) are explained in detail. It is shown that this combination of two powerful techniques is very effective for the fabrication of MLL. All steps can be done in a very precise and controlled way without introducing damage to the grown multilayer structures.

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