We have used a combined optical system of a high gain elliptic Kirkpatrick-Baez mirror system (KB) and a multilayer Laue lens (MLL) positioned in the focal plane of the KB for hard x-rays nano-focusing. The two-step focusing scheme is based on a high acceptance and high gain elliptical mirror with moderate focal length and a MLL with ultra-short focal length. Importantly, fabrication constraints, i.e. in mirror polishing and bending, as well as MLL deposition can be significantly relaxed, since (a) the mirror focus in the range of 200-500 nm is sufficient, and (b) the number of layers of the MLL can be correspondingly small. First demonstrations of this setup at the coherence beamline of the PETRA III storage ring yield a highly divergent far-field diffraction pattern, from which the autocorrelation function of the near-field intensity distribution was obtained. The results show that the approach is well suited to reach smallest spot sizes in the sub-10nm range at high flux
Recombination-active extended defects in semiconductors frequently occur at a low density which makes their structural and chemical analysis by transmission electron microscopy (TEM) techniques virtually impossible. Here an approach is described that uses in situ electron beam induced current (EBIC) in a focused ion beam machine to localize such defects for TEM lamella preparation. As an example, a defect complex occurring in block-cast multicrystalline silicon with a density of less than 10(4) cm(-3) has been prepared and analyzed by TEM. The chemical sensitivity of the technique is estimated to be about 10(13) atoms cm(-2) which is comparable to synchrotron-based x-ray techniques. The localization accuracy of the TEM lamella is shown to be better than 50 nm when low-energy EBIC is used.
X-ray diffractive techniques using Fresnel zone plate lenses of various forms are of great technical interest because of their ability to form images at very high spatial resolution, but the zone plates are unfortunately very hard to produce by lithography. Alternatively, multilayer Laue lenses (MLLs) and multilayer zone plates are used due to the higher and easily adjustable aspect ratio necessary for different wavelengths. In this paper, the fabrication of a MLL by a combination of pulsed laser deposition and focused ion beam machining is described. All steps of the production of a Ti/ZrO(2) microlens test structure with focal length of 220 microm (for a wavelength of 2.88 nm in the "water window" regime) are explained in detail. It is shown that this combination of two powerful techniques is very effective for the fabrication of MLL. All steps can be done in a very precise and controlled way without introducing damage to the grown multilayer structures.
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