Absorption losses in the Mg-doped layers significantly contribute to the modal losses in group-III-nitride-based lasers. In this paper, we investigate the influence of Mg-doping on the modal absorption of optically pumped UVC lasers grown on epitaxially laterally overgrown AlN/sapphire substrates with an averaged threading dislocation density of 1 × 109 cm–2. By varying the setback of the Mg-doping (∼1 × 1020 cm−3) within the upper Al0.70Ga0.30N waveguide layer, the overlap of the optical mode with the Mg-doped region increases. For all structures, internal losses were derived from gain spectra obtained by the variable stripe length method. The internal losses increase from 10 cm−1 for lasers without Mg-doping to 28 cm−1 for lasers with a fully Mg-doped upper waveguide layer. The overlap of the optical mode with the Mg-doped waveguide ΓMg clearly correlates with the modal losses. This allows to calculate the Mg-induced losses in current injection laser diodes by αmodMg=ΓMg×50 cm−1.
Current injection into AlGaN-based laser diode structures with high aluminum mole fractions for deep ultraviolet emission is investigated. The electrical characteristics of laser diode structures with different p-AlGaN short period superlattice (SPSL) cladding layers with various aluminum mole fractions are compared. The heterostructures contain all elements that are needed for a current-injection laser diode including cladding and waveguide layers as well as an AlGaN quantum well active region emitting near 270 nm. We found that with increasing aluminum content in the p-AlGaN cladding, the diode turn-on voltage increases, while the series resistance slightly decreases. By introducing an SPSL instead of bulk layers, the operating voltage is significantly reduced. A gain guided broad area laser diode structure with transparent p-Al0.70Ga0.30N waveguide layers and a transparent p-cladding with an average aluminum content of 81% was designed for strong confinement of the transverse optical mode and low optical losses. Using an optimized SPSL, this diode could sustain current densities of more than 4.5 kA/cm2.
The effects of the template on the optical and structural properties of Al 0.75 Ga 0.25 N/Al 0.8 Ga 0.2 N multiple quantum well (MQWs) laser active regions have been investigated. The laser structures for optical pumping were grown on planar c-plane AlN/sapphire as well as on thick epitaxially laterally overgrown (ELO) AlN layers on patterned AlN/sapphire. Two ELO AlN/sapphire templates were investigated, one with a miscut of the sapphire surface to the m-direction with an angle of 0.25°, the other with a miscut angle of 0.25°to the sapphire a-direction. The MQWs are studied by atomic force microscopy, plan-view cathodoluminescence (CL) at room temperature and 83 K as well as transmission electron microscopy using high-angle annular dark-field imaging and energy-dispersive x-ray spectroscopy. The results are compared to optical pumping measurements. It was found that the surface morphology of the templates determines the lateral wavelength distribution in the MQWs observed by spectral CL mappings. The lateral wavelength spread is largest for the laser structures grown on ELO AlN with miscut to sapphire a-direction caused by the local variation of the MQW thicknesses and the Ga incorporation at macrosteps on the ELO-AlN. A CL peak wavelength spread of up to 7 nm has been found. The MQWs grown on planar AlN/sapphire templates show a homogeneous wavelength distribution. However, due to the high threading dislocation density and the resulting strong nonradiative recombination, laser operation could not be achieved. The laser structures grown on ELO AlN/ sapphire show optically pumped lasing with a record short wavelength of 237 nm.
Smooth, uniform, and conductive Al x Ga 1Àx N layers with high aluminum mole fractions of x > 0.7 are required as cladding layers for laser diodes emitting in the deep ultraviolet spectral region. In this paper, the growth of silicon-doped AlGaN/AlGaN superlattices by metal-organic vapor phase epitaxy is investigated and compared to bulk AlGaN layers. It is found that the superlattice approach enables the growth of AlGaN layers with improved lateral uniformity of composition and strain state. In order to reduce the surface roughness, growth interruptions between the superlattice layers are investigated. With increasing growth interruption time, the average aluminum content is increasing and the superlattice period thickness is decreasing. Scanning transmission electron microscopy investigations show that the growth interruptions lead to more abrupt interfaces and to the formation of one to two monolayer thin aluminum-rich AlGaN layers at each interface. This also leads to a significantly smoother surface morphology. Low resistivities of 0.025 Ω cm are obtained for AlGaN:Si superlattices with average aluminum content of x ¼ 0.8. The influence of the surface morphology of the AlGaN cladding layers on optically pumped laser heterostructures is investigated. By using a smooth AlGaN superlattice, the lasing threshold decreases by a factor of 2 compared to lasers with bulk AlGaN cladding layers.
Smooth, uniform and conductive AlxGa1‐xN layers with high aluminum mole fractions of x > 0.7 are required as cladding layers for laser diodes emitting in the deep ultraviolet spectral region. In article number http://doi.wiley.com/10.1002/pssa.201800005 by Christian Kuhn and co‐workers, the growth of silicon doped AlGaN/ AlGaN superlattices by metal‐organic vapor phase epitaxy is investigated and compared to bulk AlGaN layers. The authors find that the superlattice approach enables the growth of AlGaN layers with improved lateral uniformity of composition and strain state. In order to reduce the surface roughness, growth interruptions between the superlattice layers are investigated. With increasing growth interruption time, the average aluminum content is increasing and the superlattice period thickness is decreasing. Scanning transmission electron microscopy investigations show that the growth interruptions lead to more abrupt interfaces and to the formation of 1 to 2 monolayer thin aluminum‐rich AlGaN layers at each interface. This also leads to a significantly smoother surface morphology. Low resistivities of 0.025 Ω cm are obtained for AlGaN:Si superlattices with average aluminum content of x = 0.8. The influence of the surface morphology of the AlGaN cladding layers on optically pumped laser heterostructures is investigated. By using a smooth AlGaN superlattice the lasing threshold decreases by a factor of 2 compared to lasers with bulk AlGaN cladding layers.
InGaN quantum dots (QDs) were grown on GaN templates in the Stranski–Krastanov growth mode at 675 °C via metalorganic vapor phase epitaxy (MOVPE). Typically, QDs with overall density of 109 cm−2, an average diameter 50 nm and average height of 7 nm were obtained. A systemic investigation on the influence of group III and group V partial pressure on the size and distribution of the InGaN QDs is reported. A higher growth rate and/or higher V/III ratio increases the mean height and the density of QDs. The distribution of the dots is found to scale with growth rate and the V/III ratio. This is attributed to a reduction in the surface diffusion of adatoms as the results of increase in partial pressure of the precursor in the reactor.
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