Solid state UV emitters have many advantages over conventional UV sources. The (Al,In,Ga)N material system is best suited to produce LEDs and laser diodes from 400 nm down to 210 nm—due to its large and tuneable direct band gap, n- and p-doping capability up to the largest bandgap material AlN and a growth and fabrication technology compatible with the current visible InGaN-based LED production. However AlGaN based UV-emitters still suffer from numerous challenges compared to their visible counterparts that become most obvious by consideration of their light output power, operation voltage and long term stability. Most of these challenges are related to the large bandgap of the materials. However, the development since the first realization of UV electroluminescence in the 1970s shows that an improvement in understanding and technology allows the performance of UV emitters to be pushed far beyond the current state. One example is the very recent realization of edge emitting laser diodes emitting in the UVC at 271.8 nm and in the UVB spectral range at 298 nm. This roadmap summarizes the current state of the art for the most important aspects of UV emitters, their challenges and provides an outlook for future developments.

For AlGaN-based multi-quantum-well light emitters grown on c-plane substrates there is a tendency for the polarization of the emitted light to switch from transverse electric (TE) polarization to transverse magnetic (TM) polarization as the wavelength decreases. This transition depends on various factors that include the strain in the quantum well. Experimental results are presented that illustrate the phenomenon for nitride light emitting diodes (LEDs) grown on sapphire and on bulk AlN. Model calculations are presented which quantify the dependence of the TE/TM switch on the quantum well strain and the Al composition in the barriers surrounding the well.

Selective-area epitaxy is used to form three-dimensional (3D) GaN structures providing semipolar crystal facets. On full 2-in. sapphire wafers we demonstrate the realization of excellent semipolar material quality by introducing inverse GaN pyramids. When depositing InGaN quantum wells on such a surface, the specific geometry influences thickness and composition of the films and can be nicely modeled by gas phase diffusion processes. Various investigation methods are used to confirm the drastically reduced piezoelectric polarization on the semipolar planes. Complete electrically driven light-emitting diode test structures emitting in the blue and blue/green spectral regions show reasonable output powers in the milliwatt regime. Finally, first results of the integration of the 3D structures into a conventional laser design are presented

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Optically pumped ultraviolet lasers were fabricated on low-defect-density bulk (0001) AlN substrates. AlxGa1-xN/AlyGa1-yN heterostructures were grown by metal–organic vapor phase epitaxy near atmospheric pressure. Time-resolved photoluminescence studies of the multiple quantum well emission show long decay times of 900 ps at room temperature and confirm the high structural quality of the epitaxial layers. Laser resonators with a length of about 1 mm were formed by cleaving the AlN crystal to obtain m-plane mirror facets. Lasing is demonstrated at a wavelength of 267 nm with a threshold power density as low as 126 kW/cm2 at room temperature. The laser emission was transverse electrically polarized.

Semipolar ð1122Þ oriented GaN has been grown on a prestructured r-plane sapphire substrate. By using silicon doped marker layers (MLs) we have been able to monitor the growth evolution of the stripes until coalescence. With that technique we correlated the growth type (direction) with the results of cathodoluminescence (CL) and transmission electron microscopy. Both characterization methods show only a few defects for the major part of the structure and a relatively high defect density for material grown in a-direction at one side of the stripes. It is shown that during coalescence these defects are mainly terminated resulting in a flat, planar ð1122Þ GaN layer with strongly reduced defect density. Additionally, X-ray diffraction (XRD) measurements show the high quality of these layers.

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The authors demonstrate the fabrication and evaluation of bright semipolar GaInN∕GaN blue light emitting diodes (LEDs). The structures are realized by growing five GaInN∕GaN quantum wells on the {11¯01} side facets of selectively grown n-GaN stripes with triangular shape running along the ⟨112¯0⟩ direction covered with a Mg-doped GaN top layer. The growth was done by metal organic vapor phase epitaxy using a conventional [0001] sapphire substrate. The devices have circular mesa structures with diameters between 70 and 140μm. Continuous wave on-wafer optical output powers as high as 700μW and 3mW could be achieved under dc conditions for 20 and 110mA, respectively. The current dependent blueshift of the peak emission wavelength caused by screening effects of the piezoelectric field was only 1.5nm for currents between 1 and 50mA. This is less than half the value measured on c-plane LEDs and confirms the reduced piezoelectric field in our LED structures.