We report a new and facile method for synthesizing 3D platinum nanoflowers (Pt Nfs) on a scratched silicon substrate by electroless galvanic displacement and discuss the applications of the Pt Nfs in surface-assisted laser desorption/ionization-mass spectrometry (SALDI-MS). Surface scratching of n-type silicon is essential to induce Pt Nf growth on a silicon substrate (to obtain a Pt Nf silicon hybrid plate) by the galvanic displacement reaction. The Pt Nf silicon hybrid plate showed excellent SALDI activity in terms of the efficient generation of protonated molecular ions in the absence of a citrate buffer. We propose that the acidity of the Si-OH moieties on silicon increases because of the electron-withdrawing nature of the Pt Nfs; hence, proton transfer from the Si-OH groups to the analyte molecules is enhanced, and finally, thermal desorption of the analyte ions from the surface occurs. Signal enhancement was observed for protonated molecular ions produced from a titania nanotube array (TNA) substrate on which Pt nanoparticles had been photochemically deposited. Moreover, surface modification of the Pt Nf silicon hybrid plate by perfluorodecyltrichlorosilane (FDTS) (to obtain an FDTS-Pt Nf silicon hybrid plate) was found to facilitate soft SALDI of labile compounds. More interestingly, the FDTS-Pt Nf silicon hybrid plate acts 1) as a high-affinity substrate for phosphopeptides and 2) as a SALDI substrate. The feasibility of using the FDTS-Pt Nf silicon hybrid plate for SALDI-MS has been demonstrated by using a β-casein digest and various analytes, including small molecules, peptides, phosphopeptides, phospholipids, carbohydrates, and synthetic polymers. The hybridization of Pt Nfs with a scratched silicon substrate has been found to be important for achieving excellent SALDI activity.
Surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) using inorganic nanoparticles has been reported as an organic matrix-free approach. However, the correlation of desorption/ionization (DI) efficiency with analyte chemical structures in SALDI-MS is not clear. In this study, we investigated the DI efficiency of 20 common amino acids and several peptides in SALDI-MS with Pt nanoparticles with thin projections on the surface (termed with Pt nanoflowers, Pt Nfs) on silicon substrates. The fluorocarbon-based hydrophobic perfluorodecyltrichlorosilane (FDTS)-Pt Nf substrates enabled the simultaneous analysis of all 20 common amino acids in negative-ion mode, whereas MALDI-MS was able to detect only two amino acids, proline and glutamic acid, from the same mixture in negative-ion mode. The SALDI-MS produced high ion yields for arginine and proline in positive-ion mode as well as for glutamic acid and aspartic acid in negative-ion mode. A linear correlation was found between the ion yield and the gas-phase proton affinity or acidity of amino acids in SALDI-MS, consistent with the MALDI-MS analysis of amino acids, although the linear correlation in the SALDI-MS was poor in comparison with that of MALDI-MS. It was suggested that the ion yields of amino acids (i.e., the DI process) are mainly determined by the same factors regardless of the ionization method employed in both MALDI performed using organic matrix and organic matrix-free SALDI.
We reported 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography one year ago 1) . In this paper we update performance status of the 1st generation system. We have improved the system further, maximum burst power is 104W (100kHz, 1 mJ EUV power @ intermediate focus), laser-EUV conversion efficiency is 2.5%. Also continuous operation time is so far up to 8 hours with 5% duty cycle is achieved. We have investigated EUV plasma creation scheme by small experimental device which is facilitated 10Hz operation (maximum). We have proposed double pulse method to create LPP plasma efficiently. This moment we found out 3.3% conversion efficiency operation condition.Based on the engineering data of ETS and small experimental device, now we are developing 2 nd generation HVM source; GL200E. The device consists of the original concepts (1) CO 2 laser driven Sn plasma, (2) Hybrid CO 2 laser system that is combination of high speed (>100kHz) short pulse oscillator and industrial cw-CO 2 , (3) Magnetic mitigation, and (4) Double pulse EUV plasma creation. The preliminary data are introduced in this paper.
We have developed a 157-nm coherent light source by two-photon resonant four-wave mixing in Xe, with two tunable single-mode 1-kHz Ti:sapphire laser systems at 768 and 681 nm. This light source has been developed to determine the instrumental function of a vacuum ultraviolet spectrometer and to evaluate optical designs for ultra-line-narrowed F(2) laser lithography. The spectral linewidth of the source was less than 0.008 pm (FWHM), with an average power of 0.6 mW.
In this Letter we describe in more detail a solid-state seeded, nanosecond pulse, multiline CO(2) oscillator designed and built for the extreme ultraviolet (EUV) laser-produced-plasma (LPP) source. Our oscillator featured quantum cascade laser seeders, a diffraction-type seed beam combiner, and a radio-frequency-discharge-excited, diffusion-cooled, slab-waveguide CO(2) gain cell in a compact multipass regenerative amplifier configuration. The oscillator generated pulses of exceptional stability in terms of envelope, energy, and spectrum. Excellent stability of output was achieved without any additional techniques. The output spectrum consisted of two laser lines of a 00(0)1-10(0)0 band of a CO(2) molecule, P20 and P22, with a target of four lines P18-P24. The pulse duration was electronically adjustable between 11 and 35 ns at a repetition frequency from a few hertz to hundreds of kilohertz. Electronic adjustment of the pulse duration was achieved by relative timing offsets of individual seeders, opening an avenue to a range of on-line adjustments of pulse shape and spectral content timing. The jitter-tolerant operation allows for easy synchronization with an external event, such as a droplet target in an EUV LPP source. A resistance to parasitic seeding of more than 40 dB was recorded. The oscillator produced up to 20 W of average output power at a repetition rate of 100 kHz in a near-diffraction-limited beam of M(2)<1.3 and a pointing stability below 50 μrad.
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