ung cancer is the most common fatal malignancy, because most of the tumors are discovered at advanced stages, and the incidence of this type of cancer is increasing worldwide. Platinum-based chemotherapy and irradiation have low effectiveness due to frequent recurrence and metastasis of the neoplasm; the overall 5-year survival rate after diagnosis remains at only 10-15%. 1) To improve the poor prognosis of this type of tumor, studies of new therapeutic strategies including immunotherapy are in progress.Although the specific functions of tumor infiltrating lymphocytes (TILs) are poorly understood, TILs are found in a variety of solid cancer tissues and have been considered to be manifestations of host immune reactions against cancer cells.2-4) It has been shown in animal models that infiltration of tumors by tumor-reactive T lymphocytes is required for efficient tumor regression.5, 6) Therefore, local cytokine effects and modulation of host cells are essential for adoptive immunotherapy rather than systemic effects. In humans, the majority of TILs consists of T cells and expresses significantly high amounts of various activation antigens, suggesting an activation of the host defense mechanism.7-9) Moreover, a multitude of tumor-specific cytotoxic T lymphocytes (CTLs) has been isolated from TILs. 10,11)

The 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography is under development. We report latest status of the device which consists of the original concepts (1) CO2 laser driven Sn plasma, (2) Hybrid CO2 laser system that is combination of high speed (>100kHz) short pulse oscillator and industrial cw-CO2, (3) Magnetic mitigation, and (4) Double pulse EUV plasma creation. Maximum burst on time power is 69W (100kHz, 0.7 mJ EUV power @ intermediate focus), laser-EUV conversion efficiency is 2.3%, duty cycle is 20% at maximum. Continuous operation time is so far up to 3 hours. Debris is efficiently suppressed by pre-pulse plasma formation and magnetic field mitigation system. Long-term performance is now under investigation. Also future plan is updated

We have developed a 157-nm coherent light source by two-photon resonant four-wave mixing in Xe, with two tunable single-mode 1-kHz Ti:sapphire laser systems at 768 and 681 nm. This light source has been developed to determine the instrumental function of a vacuum ultraviolet spectrometer and to evaluate optical designs for ultra-line-narrowed F(2) laser lithography. The spectral linewidth of the source was less than 0.008 pm (FWHM), with an average power of 0.6 mW.

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A feasibility study of next generation 6 kHz ArF laser for lithography is presented. High repetition rate operation of excimer lasers faces two technical challenges: 1) the occurrence of acoustic waves caused by the discharge in the laser chamber and 2) the huge energy consumption of the large gas flow fans. This paper describes our approach to dampen the acoustic waves. A computer simulation of acoustic wave generation inside the discharge chamber was done. The simulation correlates well with Schlieren photography measurements that visualized the acoustic waves. Based on these results, a chamber for 6 kHz repetition rate was newly designed. Measured spectral data (FHWM and E95) proved that the acoustic wave perturbation was remarkably reduced. A very efficient design method for high repetition rate laser chamber has therefore been established.

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