First generation laser-produced plasma source system for HVM EUV lithography

Mizoguchi, Hideaki; Abe, Tamotsu; Watanabe, Yukio; Ishihara, Takanobu; Ohta, Takao; Hori, Tsukasa; Kurosu, Akihiko; Komori, Hiroshi; Kakizaki, Kouji; Sumitani, Akira; Wakabayashi, Osamu; Nakarai, Hiroaki; Fujimoto, Junichi; Endo, Akira

doi:10.1117/12.846271

Cited by 33 publications

(18 citation statements)

References 6 publications

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“…We reported 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography one year ago 1) . In this paper we update performance status of the 1st generation system.…”

Section: Resultsmentioning

confidence: 99%

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Mizoguchi¹,

Abe

Watanabe

et al. 2011

SPIE Proceedings

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We reported 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography one year ago 1) . In this paper we update performance status of the 1st generation system. We have improved the system further, maximum burst power is 104W (100kHz, 1 mJ EUV power @ intermediate focus), laser-EUV conversion efficiency is 2.5%. Also continuous operation time is so far up to 8 hours with 5% duty cycle is achieved. We have investigated EUV plasma creation scheme by small experimental device which is facilitated 10Hz operation (maximum). We have proposed double pulse method to create LPP plasma efficiently. This moment we found out 3.3% conversion efficiency operation condition.Based on the engineering data of ETS and small experimental device, now we are developing 2 nd generation HVM source; GL200E. The device consists of the original concepts (1) CO 2 laser driven Sn plasma, (2) Hybrid CO 2 laser system that is combination of high speed (>100kHz) short pulse oscillator and industrial cw-CO 2 , (3) Magnetic mitigation, and (4) Double pulse EUV plasma creation. The preliminary data are introduced in this paper.

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“…We reported 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography one year ago 1) . In this paper we update performance status of the 1st generation system.…”

Section: Resultsmentioning

confidence: 99%

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Mizoguchi¹,

Abe

Watanabe

et al. 2011

SPIE Proceedings

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“…An important application of drop deformation by laser-pulse impact is found in laserproduced plasma light-sources for extreme ultraviolet (EUV) nanolithography. In these sources a nanosecond laser pulse pre-shapes a falling liquid tin drop into a thin sheet, which is subsequently ionized by a second laser pulse (Mizoguchi et al 2010;Banine et al 2011). To maximize the conversion of liquid tin to plasma a precise control of the drop shape and stability that result from the first laser impact is crucial.…”

Section: Introductionmentioning

confidence: 99%

Drop deformation by laser-pulse impact

et al. 2016

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A free-falling absorbing liquid drop hit by a nanosecond laser-pulse experiences a strong recoil-pressure kick. As a consequence, the drop propels forward and deforms into a thin sheet which eventually fragments. We study how the drop deformation depends on the pulse shape and drop properties. We first derive the velocity field inside the drop on the timescale of the pressure pulse, when the drop is still spherical. This yields the kinetic-energy partition inside the drop, which precisely measures the deformation rate with respect to the propulsion rate, before surface tension comes into play. On the timescale where surface tension is important the drop has evolved into a thin sheet. Its expansion dynamics is described with a slender-slope model, which uses the impulsive energy-partition as an initial condition. Completed with boundary integral simulations, this two-stage model explains the entire drop dynamics and its dependance on the pulse shape: for a given propulsion, a tightly focused pulse results in a thin curved sheet which maximizes the lateral expansion, while a uniform illumination yields a smaller expansion but a flat symmetric sheet, in good agreement with experimental observations. IntroductionA laser pulse interacting with an absorbing liquid body can deposit a finite amount of energy, concentrated both in time and space, which eventually triggers a dramatic hydrodynamic response. Focused nanosecond pulses have for instance been used to induce cavitation in liquids confined in capillary tubes (Vogel et al. 1996;Sun et al. 2009;Tagawa et al. 2012), or jetting and spraying in sessile drops (Thoroddsen et al. 2009). These situations involving a liquid close to a wall result in localized flows. By contrast, we consider here the situation of a mobile liquid body: the impact of a nanosecond laser pulse onto an absorbing unconfined liquid drop, which, as first described by Klein et al. (2015), has a global hydrodynamic response to the pulse: the drop propels forward at a speed of several meters per second, strongly deforms and eventually fragments (see Fig. 1). This dynamics is similar to that following a mechanical impact such as on a solid substrate or a pillar, which has been studied thoroughly (see e.g. Clanet et al. 2004;Yarin 2006;Villermaux & Bossa 2011;Kolinski et al. 2012;Riboux & Gordillo 2014;Josserand & Thoroddsen 2016), including a few studies on the fragmentation of the drop (Villermaux 2007;Xu et al. 2007;Villermaux & Bossa 2009, 2011Riboux & Gordillo 2014). A laser proves to be an adequate tool to vary the extension of the impact without arXiv:1512.02415v1 [physics.flu-dyn] 8 Dec 2015

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“…[17,18] Achieving the required droplet stability is a challenging task, even more so when small source sizes for increased brightness are required. In general two types of instabilities are distinguished: lateral (in the plane perpendicular to the jet velocity) instabilities and drop-to-drop jitter.…”

Section: Introductionmentioning

confidence: 99%

Tin droplets for LPP EUV sources

et al. 2012

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The tin droplet generator is a key component of EUV LPP sources. Small tin droplets, when combined with a high power laser, form a regenerative target with high CE. A major challenge associated with today's EUV sources is energy stability, which directly correlates with the stability of the fuel delivery system. The LEC droplet dispenser is now in its 5 th generation design, with several years of development, including studies of different nozzle types, excitation mechanisms, thermal management approaches and contamination control systems. The dispenser produces droplets in the frequency range required for both metrology and HVM EUV sources. The two relevant instability modes are drop-todrop jitter and lateral instabilities. The low frequency content of the lateral droplet displacement is compensated by a newly implemented dispenser positioning system. The drop-to-drop jitter, which is studied over 2000 s, equals 11.2% (3σ) of the mean droplet spacing, which makes individual droplet laser triggering necessary. The lateral instabilities, which are mainly relevant in the plane perpendicular to the laser axis, are determined to be in the range of 7.1% (3σ) of the droplet diameter. The lateral displacements are recorded over 2.2 hrs. The related EUV temporal energy stability (open-loop) is estimated to be 0.35% (3σ) for the worst case scenario, a laser spot size which matches the droplet diameter.

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First generation laser-produced plasma source system for HVM EUV lithography

Cited by 33 publications

References 6 publications

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Drop deformation by laser-pulse impact

Tin droplets for LPP EUV sources

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