New processes introduced by nano science into much more conventional industrial applications require fast, robust and economical reasonable inspection methods for process control and quality assurance. Developed for semiconductor industries the methods available for thin film characterization and quality control are often complex and require highly skilled operation personnel. This paper presents a new concept based on high frequency eddy current spectroscopy that allows reliable and robust thickness measurements of thin conducting films on silicon or insulation substrates with a thickness resoln. of about 2.5 nm. The transmission mode sensor configuration is a more practical method for inlinemonitoring of thin film characterization. Due to the insensitivity of the transmission mode to dislocations or slight tilting of the sample the high frequency eddy current method is a practical method for thin film characterization in the industrial environment
For near surface characterization a new high frequency eddy current device was been developed. By using a measurement frequency up to 100 MHz information of near surface areas can be acquired. Depending on the investigated material high resolution depth profiles can be derived. The obtained data with the new device were compared to those obtained with a high precision impedance analyser. It could be demonstrated that the new device measures the eddy current conductivity signal in the high frequencies much better than the impedance analyser. By sweeping the frequency from 100 kHz up to 100 MHz the technique delivers a depth profile of the electrical conductivity of the material. This kind of high frequency eddy current technique can be used for quality assurance, surface contamination control or near surface material characterization e.g. microstructure and cold work influences. It can be a powerful tool to obtain information for process control or a good / bad decision in mass production processes like for example rolling, coating, and surface treatments. The big advantage of the high frequency eddy current method is that it is fast und precise. This paper presents results with a new developed prototype Eddy-Current-Device for measurement frequencies up to 100 MHz which is first time suitable in rough industrial environment and makes expensive lab network analysers unnecessary for this kind of investigations
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