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We show full Li/S cells with the use of balanced and high capacity electrodes to address high power electro-mobile applications. The anode is made of an assembly comprising of silicon nanowires as active material densely and conformally grown on a 3D carbon mesh as a light-weight current collector, offering extremely high areal capacity for reversible Li storage of up to 9 mAh/cm2. The dense growth is guaranteed by a versatile Au precursor developed for homogenous Au layer deposition on 3D substrates. In contrast to metallic Li, the presented system exhibits superior characteristics as an anode in Li/S batteries such as safe operation, long cycle life and easy handling. These anodes are combined with high area density S/C composite cathodes into a Li/S full-cell with an ether- and lithium triflate-based electrolyte for high ionic conductivity. The result is a highly cyclable full-cell with an areal capacity of 2.3 mAh/cm2, a cyclability surpassing 450 cycles and capacity retention of 80% after 150 cycles (capacity loss <0.4% per cycle). A detailed physical and electrochemical investigation of the SiNW Li/S full-cell including in-operando synchrotron X-ray diffraction measurements reveals that the lower degradation is due to a lower self-reduction of polysulfides after continuous charging/discharging.

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Quality assurance for the production of optical components for extreme ultraviolet lithography (EUVL) strongly requires at-wavelength metrology. Initially, the at-wavelength characterization of mirrors and masks was developed using synchrotron radiation of electron storage rings, e.g. BESSY II. For the production process of EUV optics, however, the immediate access to metrology tools is necessary and the availability of laboratory devices is mandatory. Recently, an EUV reflectometer (EUVR) for large samples has been put into operation. It consists of a laser-produced plasma (LPP) radiation source, a monochromator and a large goniometer system. It can handle samples with diameters of up to 500 mm, thicknesses of up to 200 mm and weights of up to 30 kg. The wavelength can be varied from 10 nm to 16 nm. The spot size on the sample surface is about 2 mm in both directions. The angle of incidence can be varied from 3° to grazing incidence. In this paper, we describe the measurement uncertainties achieved in the EUVR with reference to measurements by the Physikalisch-Technische Bundesanstalt at its soft x-ray radiometry beamline at BESSY II. Using appropriate reference points for the wavelength calibration of the monochromator, the absolute wavelength uncertainty is below 4 pm in the spectral range from 11 nm to 15 nm. The measured peak reflectance of multilayer mirrors shows a constant offset of about 1% absolute and is reproduced within 0.2%.