2005
DOI: 10.1016/j.apsusc.2005.01.113
|View full text |Cite
|
Sign up to set email alerts
|

Laboratory LPP EUV reflectometer working with non-polarized radiation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
5
0
1

Year Published

2006
2006
2019
2019

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 8 publications
(7 citation statements)
references
References 6 publications
0
5
0
1
Order By: Relevance
“…This is a critical difference as compared to previously reported estimate for the same DPP source, 2 based on measurements performed at the source level where the amount of DUV OoB at IF was extrapolated on the basis of various assumptions rather than directly quantified; thus resulting in an overestimated result. 20 Having estimated as accurately as possible all the required parameters, the model is able to predict the DUV=EUV ratio at the wafer level. Filters with known transmission and an aluminum mirror with known reflectivity were used.…”
Section: A Oob Model Predictionsmentioning
confidence: 99%
“…This is a critical difference as compared to previously reported estimate for the same DPP source, 2 based on measurements performed at the source level where the amount of DUV OoB at IF was extrapolated on the basis of various assumptions rather than directly quantified; thus resulting in an overestimated result. 20 Having estimated as accurately as possible all the required parameters, the model is able to predict the DUV=EUV ratio at the wafer level. Filters with known transmission and an aluminum mirror with known reflectivity were used.…”
Section: A Oob Model Predictionsmentioning
confidence: 99%
“…But with the availability of table-top EUV/XUV light sources (laser produced and gas discharge plasma sources), optics analysis is not limited to the synchrotron facilities any more. Still the main focus for EUV reflectometry/scatterometry setups is the characterization of EUVL components like optics and masks [26][27][28][29]. Aside from that, only little work seems to be going on with the application of EUV reflectometry for surface analysis [30].…”
Section: Euv/xuv Surface Analysis Using a Reflectometry Setupmentioning
confidence: 99%
“…La focalisation est réalisée en deux temps : un miroir courbe en entrée permet la focalisation sagittale, et la focalisation tangentielle est réalisée par le réseau de sortie. La section du faisceau EUV au centre de l'enceinte expérimentale est actuellement de 1 × 10 mm 2 …”
Section: Mise En Formeunclassified